Semiconductor device and manufacturing method thereof

ABSTRACT

A method for manufacturing a semiconductor device and a semiconductor device produced thereby. For example and without limitation, various aspects of this disclosure provide a method for manufacturing a semiconductor device, and a semiconductor device produced thereby, that comprises an interposer without through silicon vias.

CROSS-REFERENCE TO RELATED APPLICATIONS/INCORPORATION BY REFERENCE

The present application makes reference to, claims priority to, andclaims the benefit of Korean Patent Application No. 10-2015-0037481,filed on Mar. 18, 2015 in the Korean Intellectual Property Office andtitled “SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF,” thecontents of which are hereby incorporated herein by reference in theirentirety.

BACKGROUND

Present methods for forming various semiconductor devices, for exampleincluding an interposer with through silicon vias (TSVs), areinadequate, for example utilizing high-complexity and/or high-costprocesses. Further limitations and disadvantages of conventional andtraditional approaches will become apparent to one of skill in the art,through comparison of such approaches with the present disclosure as setforth in the remainder of the present application with reference to thedrawings.

BRIEF DESCRIPTION OF SEVERAL VIEWS OF THE DRAWINGS

FIGS. 1A to 1J show cross-sectional views illustrating a method ofmanufacturing a semiconductor device, in accordance with various aspectsof the present disclosure;

FIG. 2 shows a cross-sectional view illustrating a semiconductor device,in accordance with various aspects of the present disclosure;

FIG. 3 shows a cross-sectional view illustrating a semiconductor device,in accordance with various aspects of the present disclosure;

FIG. 4 shows a cross-sectional view illustrating a semiconductor device,in accordance with various aspects of the present disclosure;

FIG. 5 shows a cross-sectional view illustrating a semiconductor device,in accordance with various aspects of the present disclosure;

FIG. 6 shows a cross-sectional view illustrating a semiconductor device,in accordance with various aspects of the present disclosure;

FIGS. 7A to 7H show cross-sectional views illustrating a method ofmanufacturing a semiconductor device, in accordance with various aspectsof the present disclosure;

FIG. 8 shows a cross-sectional view illustrating a semiconductor device,in accordance with various aspects of the present disclosure;

FIGS. 9A to 9J show cross-sectional views illustrating a method ofmanufacturing a semiconductor device, in accordance with various aspectsof the present disclosure;

FIG. 10 shows a cross-sectional view illustrating a semiconductordevice, in accordance with various aspects of the present disclosure;

FIG. 11A shows a cross-sectional view of a structure in an examplescenario in which a process of planarizing an interposer is notperformed, and FIG. 11B shows a cross-sectional view of a structure inan example scenario in which a process of planarizing an interposer isperformed, in accordance with various aspects of the present disclosure;

FIG. 12A shows a cross-sectional view illustrating a first exampleplanarization process, and FIG. 12B shows a cross-sectional viewillustrating a second example planarization process, in accordance withvarious aspects of the present disclosure;

FIGS. 13A to 13J show cross-sectional views illustrating a method ofmanufacturing a semiconductor device, in accordance with various aspectsof the present disclosure;

FIG. 14 shows a cross-sectional view illustrating a semiconductordevice, in accordance with various aspects of the present disclosure;

FIGS. 15A to 15H show cross-sectional views illustrating a method ofmanufacturing a semiconductor device, in accordance with various aspectsof the present disclosure;

FIG. 16 shows a cross-sectional view illustrating a method of separatinga semiconductor die from a carrier, in accordance with various aspectsof the present disclosure;

FIG. 17 shows a cross-sectional view illustrating a semiconductordevice, in accordance with various aspects of the present disclosure;

FIGS. 18A to 18J show cross-sectional views illustrating a method ofmanufacturing a semiconductor device, in accordance with various aspectsof the present disclosure;

FIG. 19 shows a cross-sectional view illustrating a semiconductordevice, in accordance with various aspects of the present disclosure;

FIGS. 20A to 20J show cross-sectional views illustrating a method ofmanufacturing a semiconductor device, in accordance with various aspectsof the present disclosure;

FIG. 21 shows a cross-sectional view illustrating a semiconductordevice, in accordance with various aspects of the present disclosure;

FIGS. 22A to 22J show cross-sectional views illustrating a method ofmanufacturing a semiconductor device, in accordance with various aspectsof the present disclosure; and

FIG. 23 shows a cross-sectional view illustrating a semiconductordevice, in accordance with various aspects of the present disclosure.

SUMMARY

Various aspects of this disclosure provide a method for manufacturing asemiconductor device and a semiconductor device produced thereby. Forexample and without limitation, various aspects of this disclosureprovide a method for manufacturing a semiconductor device, and asemiconductor device produced thereby, that comprises an interposerwithout through silicon vias.

DETAILED DESCRIPTION OF VARIOUS ASPECTS OF THE DISCLOSURE

The following discussion presents various aspects of the presentdisclosure by providing examples thereof. Such examples arenon-limiting, and thus the scope of various aspects of the presentdisclosure should not necessarily be limited by any particularcharacteristics of the provided examples. In the following discussion,the phrases “for example,” “e.g.,” and “exemplary” are non-limiting andare generally synonymous with “by way of example and not limitation,”“for example and not limitation,” and the like.

As utilized herein, “and/or” means any one or more of the items in thelist joined by “and/or”. As an example, “x and/or y” means any elementof the three-element set {(x), (y), (x, y)}. In other words, “x and/ory” means “one or both of x and y.” As another example, “x, y, and/or z”means any element of the seven-element set {(x), (y), (z), (x, y), (x,z), (y, z), (x, y, z)}. In other words, “x, y and/or z” means “one ormore of x, y, and z.”

The terminology used herein is for the purpose of describing particularexamples only and is not intended to be limiting of the disclosure. Asused herein, the singular forms are intended to include the plural formsas well, unless the context clearly indicates otherwise. It will befurther understood that the terms “comprises,” “includes,” “comprising,”“including,” “has,” “have,” “having,” and the like when used in thisspecification, specify the presence of stated features, integers, steps,operations, elements, and/or components, but do not preclude thepresence or addition of one or more other features, integers, steps,operations, elements, components, and/or groups thereof.

It will be understood that, although the terms first, second, etc. maybe used herein to describe various elements, these elements should notbe limited by these terms. These terms are only used to distinguish oneelement from another element. Thus, for example, a first element, afirst component or a first section discussed below could be termed asecond element, a second component or a second section without departingfrom the teachings of the present disclosure. Similarly, various spatialterms, such as “upper,” “lower,” “side,” and the like, may be used indistinguishing one element from another element in a relative manner. Itshould be understood, however, that components may be oriented indifferent manners, for example a semiconductor device may be turnedsideways so that its “top” surface is facing horizontally and its “side”surface is facing vertically, without departing from the teachings ofthe present disclosure. Additionally, the term “on” will be utilized inthe document to mean both “on” and “directly on” (e.g., with nointervening layer).

In the drawings, various dimensions (e.g., layer thickness, width, etc.)may be exaggerated for illustrative clarity. Additionally, likereference numbers are utilized to refer to like elements through thediscussions of various examples.

Various aspects of the present disclosure provide a semiconductor devicecomprising an interposer without a through silicon via and amanufacturing method thereof, for example comprising the utilization ofbumping equipment without the need for specialized through silicon viaequipment.

Various aspects of the present disclosure provide an example method ofmanufacturing a semiconductor device. The example method may, forexample, comprise forming a dielectric layer on a carrier, forming aconductive layer on the dielectric layer (or providing a carrier with adielectric layer and/or conductive layer formed thereon), removing thecarrier, forming an opening in the dielectric layer to expose theconductive layer to the outside, connecting a semiconductor die to theconductive layer exposed to the outside through the opening, and moldingthe semiconductor die with a molding material.

Various aspects of the present disclosure also provide another examplemethod of manufacturing a semiconductor device. The example method may,for example, comprise forming a dielectric layer on a carrier, forming afirst conductive layer on the dielectric layer (or providing a carrierwith a dielectric layer and/or conductive layer formed thereof),connecting a semiconductor die to the first conductive layer, moldingthe semiconductor die with a molding material; removing the carrier,forming an opening in the dielectric layer to expose the firstconductive layer to the outside, and forming, on the dielectric layer, asecond conductive layer connected to the first conductive layer throughthe opening.

Various aspects of the present disclosure provide another example methodof manufacturing a semiconductor device. The example method may, forexample, comprise forming a dielectric layer on a carrier (or providinga carrier with a dielectric layer formed thereon), a conductive layer onthe dielectric layer, connecting a semiconductor die to the conductivelayer, molding the semiconductor die with a molding material, removingthe carrier, and forming an opening in the dielectric layer to exposethe conductive layer to the outside.

Various aspects of the present disclosure provide an examplesemiconductor device. The example semiconductor device may, for example,comprise a first conductive layer (e.g., a redistribution layer) and adielectric layer (e.g., a passivation layer) covering the firstconductive layer, a semiconductor die electrically connected to thefirst conductive layer for example via an aperture in the dielectriclayer, and a mold material around the semiconductor die, wherein theinterposer is configured to allow a second conductive layer (e.g., aseed layer) and a third conductive layer (e.g., a redistribution layer)to be formed below the dielectric layer, where the third conductivelayer extending into and/or through the dielectric layer is directly onthe second conductive layer, and a micro bump pad connected to thesemiconductor die is on the third conductive layer.

Various aspects of the present disclosure also provide another examplesemiconductor device. The second example semiconductor device may, forexample, comprise an interposer (or signal redistribution structure of apackage) comprising a dielectric layer, a first conductive layer abovethe dielectric layer, and a second dielectric layer below the dielectriclayer, a semiconductor die connected to the first conductive layer, anda mold material around the semiconductor die, wherein the interposer isconfigured to allow a first seed layer and a first conductive layer tobe formed above the dielectric layer and allow a second seed layer and asecond conductive layer to be formed below the dielectric layer, and thefirst seed layer and the second seed layer are directly and electricallyconnected to each other.

Various aspects of the present disclosure also provide another examplesemiconductor device. The third example semiconductor device may, forexample, comprise an interposer (or signal redistribution structure of apackage) comprising a dielectric layer and a conductive layer formed onthe dielectric layer, a semiconductor die connected to the conductivelayer, and a mold material around the semiconductor die, wherein theinterposer is configured to allow a first seed layer and a firstconductive layer to be formed on the dielectric layer, an under bumpseed layer extending into and/or through the dielectric layer isdirectly below the first seed layer, and an under bump metal is formedbelow the under bump seed layer.

The discussion will now refer to various example illustrations providedto enhance the understanding of the various aspects of the presentdisclosure. It should be understood that the scope of this disclosure isnot limited by the specific characteristics of the examples provided anddiscussed herein.

Referring to FIGS. 1A to 1J, such figures show cross-sectional viewsillustrating a method of manufacturing a semiconductor device 100, inaccordance with various aspects of the present disclosure. The examplemanufacturing method may, for example, comprise providing a carrier 110with a first dielectric layer 111, forming a first conductive layer 121,forming a second conductive layer 123 and an under bump metal 125,attaching a first wafer support system 1, removing the carrier 110,forming an opening 111 a in the first dielectric layer 111, forming amicro bump pad 126 at the opening 111 a, attaching a semiconductor die130 and molding with a mold material 140 (e.g., a resin, encapsulant,molding compound, etc.), separating the first wafer support system 1 andattaching a second wafer support system 2 and attaching a conductiveinterconnection structure 160, and separating the second wafer supportsystem 2.

As shown in FIG. 1A, during the providing (or forming) of the carrier110 with the first dielectric layer 111, the carrier 110 such as, forexample, a silicon wafer with a planar top surface and a planar bottomsurface is provided. The carrier 110 (or any carrier discussed herein)may comprise any of a variety of different types of carrier materials.The carrier 110 may, for example, comprise a semiconductor material(e.g., silicon, GaAs, etc.), glass, ceramic (e.g., porous ceramic,etc.), metal, etc. The carrier 110 may also comprise any of a variety ofdifferent types of configurations. For example, the carrier 110 may bein a mass form (e.g., a wafer form, a rectangular panel form, etc.).Also for example, the carrier 110 may be in a singular form (e.g.,singulated from a wafer or panel, originally formed in a singular form,etc.). The carrier 110 may, for example, share any or allcharacteristics with any carrier discussed herein.

A first dielectric layer 111 such as, for example, an inorganicdielectric layer (e.g., a silicon oxide layer, a silicon nitride layer,oxide layer, nitride layer, etc.) may be (or may have been) formed onthe surface of the carrier 110. For example, the first dielectric layer111 may have been (or may be) formed through an oxidation process. Forexample, a silicon oxide layer and/or silicon nitride layer of apredetermined thickness may be formed by supplying oxygen gas and/ornitride gas to a silicon wafer at a temperature of approximately 900° C.or higher (e.g., a thermal oxidation process, etc.). The firstdielectric layer 111, or a portion thereof, may also comprise a nativeoxide layer naturally formed on the carrier 110 without manufacturingprocess assistance. The first dielectric layer 111 may also be referredto herein as a protective layer. The first dielectric layer 111 may, forexample, be from 0.01 to 0.8 microns thick.

In comparison to a polymer layer that is an organic material, a layer ofinorganic material (e.g., a silicon oxide layer, a silicon nitridelayer, etc.) may allow (or assist) a photo etching process to beperformed more accurately, so that a conductive layer of a relativelyfiner line/space/thickness (e.g., trace width, spacing between adjacenttraces, and/or trace thickness) may be formed on the layer of inorganicmaterial. For example, a conductive layer with a line/space/thickness ofabout 2/2/2 μm to about 10/10/10 μm may be formed on a layer ofinorganic material (e.g., on a silicon oxide (or silicon dioxide) layer,silicon nitride layer, oxide layer, nitride layer, etc.). Note that thescope of this disclosure is not limited to inorganic dielectricmaterials. For example, in various example implementations, thedielectric layer 111 may comprise an organic material. Additionally,note that the carrier 110 need not be provided with the dielectric layer111.

As shown in FIG. 1B, during the forming of the first conductive layer121, which may also be referred to herein as a redistribution layer, thefirst conductive layer 121 may be formed on the first dielectric layer111. In one example implementation, a first seed layer 121 a (see, e.g.,FIG. 3) is formed on the first dielectric layer 111, and the firstconductive layer 121 is formed on the first seed layer 121 a. The firstconductive layer 121 may then be covered with a second dielectric layer122, which may also be referred to herein as a passivation layer.

The first seed layer 121 a (or any seed layer discussed herein) may beformed of any of a variety of materials, including but not limited totungsten, titanium, equivalents thereof, combinations thereof, alloysthereof, etc. The first seed layer 121 a may, for example, be formedutilizing any of a variety of processes. For example, the first seedlayer 121 a may be formed utilizing one or more of an electrolessplating process, an electrolytic plating process, a sputtering process,etc. For example, the seed layer 121 a may be formed of TiW with a Cutarget. Note that the first seed layer 121 a and/or any seed layerdiscussed herein may also be referred to as a conductive layer. Alsonote that any seed layer discussed herein may be formed utilizing thesame or similar materials and/or processes, or may be formed utilizingdifferent respective materials and/or processes. Additionally, note thatthe first seed layer 121 a and/or any seed layer discussed herein maycomprise multiple layers. As an example, a first layer may comprise TiW,and a second layer may comprise Cu.

The first conductive layer 121 may be formed of any of a variety ofmaterials. For example, the first conductive layer 121 may be formed ofcopper, aluminum, gold, silver, palladium, equivalents thereof,combinations thereof, alloys thereof, other conductive materials, etc.The first conductive layer 121 may, for example, be formed utilizing anyof a variety of processes. For example, the first conductive layer 121may be formed utilizing one or more of an electroless plating process,an electrolytic plating process, a sputtering process, etc. Thepatterning or routing of the first conductive layer 121 may, forexample, be accomplished utilizing any of a variety of processes. Forexample, the first conductive layer 121 may be patterned or routedutilizing a photo etching process using a photoresist, etc. For example,photo resist may be spin coated (or otherwise applied, such as a dryfilm, etc.) on the seed layer 121 a. The photo resist may then be setusing, for example, a masking and illumination process. Then portions ofthe photo resist may be etched away, residual photo resist may beremoved in a descum process, and drying (e.g., spin rinse drying) may beperformed. After forming the first conductive layer 121, the templatemay be stripped (e.g., chemically stripped, etc.), and the seed layer121 a that is exposed from the first conductive layer 121 may be etched.

Note that the first conductive layer 121 and/or any conductive layerdiscussed herein may also be referred to as a redistribution layer. Alsonote that any conductive layer discussed herein may be formed utilizingthe same or similar materials and/or processes, or may be formedutilizing different respective materials and/or processes. Additionally,note that the first conductive layer 121, and/or the forming thereof,may share any or all characteristics with any other conductive layer,and/or the forming thereof, disclosed herein.

The second dielectric layer 122 may be formed of any of a variety ofmaterials. For example, the second dielectric layer 122 may be formed ofan organic material (e.g., polymers such as polyimide, Benzocyclobutene(BCB), Polybenzoxazole (PBO), equivalents thereof, combinations thereof,etc.). Also for example, the second dielectric layer 122 may be formedof an inorganic material. The second dielectric layer 122 may be formedutilizing any of a variety of processes. For example, the seconddielectric layer 122 may be formed utilizing one or more of spincoating, spray coating, dip coating, rod coating, equivalents thereof,combinations thereof, etc. Note that the second dielectric layer 122and/or any dielectric layer discussed herein may also be referred to asa passivation layer. Also note that any dielectric layer discussedherein may be formed utilizing the same or similar materials and/orprocesses, or may be formed utilizing different respective materialsand/or processes. Additionally, note that the second dielectric layer121, and/or the forming thereof, may share any or all characteristicswith any other dielectric layer, and/or the forming thereof, disclosedherein.

As discussed herein, in an example implementation, since the firstconductive layer 121 (e.g., with or without an underlying seed layer 121a) may be formed on the inorganic first dielectric layer 111 (e.g.,directly on the inorganic first dielectric layer 111), it may be formed(or more easily formed) to have a finer line/space/thickness incomparison to other conductive layers, which may be formed on organicdielectric layers.

Formation of the first conductive layer 121 (e.g., with or without aseed layer 121 a) and the second dielectric layer 122 may be repeatedany number of times (e.g., utilizing the same materials and/or processesor different respective materials and/or processes). The exampleillustrations in FIGS. 1B-1J show two formations of such layers. Assuch, the layers are provided with similar labels in the figures (e.g.,repeating the first conductive layer 121 and the second dielectric layer122).

An opening 122 a (or aperture) may, for example, be formed in the seconddielectric layer 122, and a specific area of the first conductive layer121 may be exposed to the outside through the opening 122 a. The opening122 a may be formed in any of a variety of manners (e.g., mechanicaland/or laser ablation, chemical etching, photolithography, etc.). Notethat the second dielectric layer 122 (or any dielectric layer discussedherein) may also be originally formed having opening 122 a, for exampleby masking, or other selective dielectric layer formation process.

As shown in FIG. 1C, during the forming of the second conductive layer123 and the under bump metal 125, the second conductive layer 123 andunder bump metal 125 of at least one layer are formed on the firstconductive layer 121 and/or on the second dielectric layer 122.

In one example implementation, a second seed layer 123 a (see, e.g.,FIG. 3) is formed at the inside of the opening 122 a (e.g., on sidewalls of the opening 122 a formed in the second dielectric layer 122and/or on the first conductive layer 121 exposed by the opening 122 a)and/or outside of the opening 122 a (e.g., on the top surface of thesecond dielectric layer 122). As discussed herein, the second seed layer123 a may be formed using the same material(s) and/or process(es) asused to form the first seed layer 121 a, or may be formed usingdifferent respective material(s) and/or process(es). The second seedlayer 123 a (or any seed layer discussed herein) may also be referred toherein as a conductive layer.

Continuing the example implementation, the second conductive layer 123is formed on the second seed layer 123 a. For example, the secondconductive layer 123 may be formed to fill (or at least cover sidesurfaces of) the opening 122 a in the second dielectric layer 122. Thesecond conductive layer 123 may, for example, be formed using the samematerial(s) and/or processes as the first conductive layer 121, or maybe formed using different respective material(s) and/or process(es). Thesecond conductive layer 123 may also be referred to herein as aredistribution layer.

The second conductive layer 123 may then, for example, be covered withthe third dielectric layer 124. The third dielectric layer 124 may beformed of any of a variety of materials and/or utilizing any of avariety of dielectric-forming processes. For example, the thirddielectric layer 124 may be formed utilizing the same material(s) and/orprocess(es) as utilized to form the second dielectric layer 122.

An opening 124 a (or aperture) may, for example, be formed in the thirddielectric layer 124, and a specific area of the second conductive layer123 may be exposed to the outside through the opening 124 a. The opening124 a may be formed in any of a variety of manners (e.g., mechanicaland/or laser ablation, chemical etching, etc.). Alternatively, forexample, the third dielectric layer 124 may be originally formed withthe opening 124 a therein.

An under bump seed layer 125 a (see, e.g., FIG. 3) may, for example, beformed at the inside of the opening 124 a (e.g., on side walls of theopening 124 a formed in the third dielectric layer 124 and/or on thesecond conductive layer 123 exposed by the opening 124 a) and/or outsideof the opening 124 a (e.g., on the top surface of the third dielectriclayer 124, for example around and/or encircling the opening 124 a). Asdiscussed herein, the under bump seed layer 125 a may be formed usingthe same material(s) and/or process(es) as used to form the first seedlayer 121 a and/or the second seed layer 123 a, or may be formed usingdifferent respective material(s) and/or process(es). The under bump seedlayer 125 a (or any seed layer discussed herein) may also be referred toherein as a conductive layer.

An under bump metal 125 is formed on the under bump seed layer 125 a.The under bump metal 125 may be formed of any of a variety of materials,non-limiting examples of which are presented herein. For example, theunder bump metal 125 may be formed of at least one of chrome, nickel,palladium, gold, silver, alloys thereof, combinations thereof,equivalents thereof, etc. The under bump metal 125 may, for example,comprise Ni and Au. Then under bump metal 125 may also, for example,comprise Cu, Ni, and Au. The under bump metal 125 may be also formedutilizing any of a variety of processes, non-limiting examples of whichare presented herein. For example, the under bump metal 125 may beformed utilizing one or more of an electroless plating process,electroplating process, sputtering process, etc. The under bump metal125 may, for example, prevent or inhibit the formation of anintermetallic compound at the interface between the conductiveinterconnection structure 160 and the second conductive layer 123,thereby improving the reliability of the connection to the conductiveinterconnection structure 160. The under bump metal 125 may also bereferred to herein as a conductive layer. Note that the under bump metal125 may comprise multiple layers. For example, the under bump metal 125may comprise a first layer of Ni and a second layer of Au.

Though not illustrated in FIGS. 1A-1J, following formation of the underbump metal 125, an edged trim (or profile) process may be performed, forexample in which an edge of the wafer being processed is trimmed (orprofiled). Such trimming may be performed in a variety of manners, forexample by grinding. Such edge trimming may, for example, protect thewafer from chipping and flaking during subsequent processing.

For discussion purposes herein, the first conductive layer 121, thesecond dielectric layer 122, the second conductive layer 123, and thethird dielectric layer 124 may be considered to be components of aninterposer 120. Furthermore, the under bump metal 125 and the micro bumppad 126 described herein may also be considered to be components of theinterposer 120. Note that term “interposer” is used herein to refer to ageneral package structure (e.g., a dielectric and conductor layeredstructure) that is interposed between other structures, and the scope ofthis disclosure should not be limited or defined by arbitrary notionsregarding interposer composition.

As shown in FIG. 1D, during the attaching of the first wafer supportsystem 1 (WSS), the first wafer support system 1 is attached to thethird dielectric layer 124. For example, the first wafer support system1 may be attached to the third dielectric layer 124 and to the underbump metal 125. At this point, the carrier 110 that is shown at thebottom of FIG. 1C is repositioned to the top of FIG. 1D (e.g., thediagram is inverted or rotated). The first WSS 1 may be attached to thethird dielectric layer 124 and/or to the under bump metal 125 in any ofa variety of manners, non-limiting examples of which are providedherein. For example, the first WSS 1 (or any WSS discussed herein) maybe attached to the third dielectric layer 124 and/or to the under bumpmetal 125 utilizing a temporary adhesive that loses its adhesion whenexposed to thermal energy or light energy, when exposed to particularchemicals, etc. One or more additional release layers may also beutilized to ease subsequent release of the first wafer support system 1.The attachment process may, for example, comprise baking the assembly(e.g., at 250° for 30 mins, etc.). The first wafer support system 1 maybe formed from any of a variety of materials. For example, the first WSS1 (or any WSS discussed herein) may be formed from one or more of asilicon wafer, a glass wafer, a ceramic wafer, a metal wafer, etc.Though the first WSS 1 is generally presented herein in the form of awafer, the scope of this disclosure is not limited to such shape.

As shown in FIG. 1E, during the removing of the carrier 110, the carrier110 (for example, a silicon wafer on which the first dielectric layer111 was formed) on a side of the structure opposite the first wafersupport system 1 is removed. In an example implementation, most of thecarrier 110 may be removed through a mechanical grinding process andthen, the remaining carrier 110 may be removed through a chemicaletching process. For example, a silicon carrier may be ground to 10-30um thickness, and then the remainder may be removed by a process otherthan grinding (e.g., by chemical etching, etc.). In another examplescenario in which the first wafer support system 1 comprises a glasswafer or plate, such glass wafer or plate is removed. In such a manner,as a result, only the first dielectric layer 111 (for example, a siliconoxide layer and/or a silicon nitride layer) formed on the surface of thecarrier 110 remains. For example, as illustrated in FIG. 1E, only thefirst dielectric layer 111 of a predetermined thickness remains on thefirst conductive layer 121 and the second dielectric layer 122. Notethat the carrier removal process may also remove a portion of the firstdielectric layer 111; for example, the first dielectric layer 111 may bethinner after removal of the carrier 110 than when originally formed onthe carrier 110. In an example implementation, the first dielectriclayer 111 may be formed of an inorganic material, and the second andthird dielectric layers 122 and 124 may be formed of an organicmaterial. Note, however, that the scope of the present disclosure is notlimited to such example types of material.

As shown in FIG. 1F, during the forming of the openings 111 a (orapertures) in the first dielectric layer 111, a plurality of openings111 a are selectively formed in the first dielectric layer 111. Theopenings 111 a may be formed in any of a variety of manners (e.g.,mechanical and/or laser ablation, chemical etching, photo etchingprocess, photo-masking and etching process, etc.). Each of the openings111 a may, for example, correspond to a respective specific area of thefirst conductive layer 121 exposed to the outside by the opening 111 a.In an example implementation, an opening 111 a exposes a respectivespecific area of the first conductive layer 121 to the outside throughthe inorganic first dielectric layer 111. In an example implementationin which the first conductive layer 121 was formed on a first seed layer121 a, a specific area of the first seed layer 121 a on which the firstconductive layer 121 was formed is exposed to the outside through theinorganic first dielectric layer 111. Note that in an example scenarioin which a dielectric layer (or passivation layer) mask is utilizedduring a process of etching the openings 111 a, the dielectric layer maybe stripped after such etching, but may also remain (e.g., as apassivation layer, etc.).

As shown in FIG. 1G, during the forming of the micro bump pad 126 (orother pad, land, attachment structure, die attachment structure, etc.)in the opening 111 a, the micro bump pad 126 is formed in the opening111 a so that the micro bump pad 126 is electrically connected to thefirst conductive layer 121 (e.g., directly connected, connected via aseed layer, etc.). In an example implementation, the micro bump seedlayer 126 a (e.g., as shown in FIGS. 2-6) is formed at the inside of theopening 111 a (e.g., on side walls of the opening 111 a formed in thefirst dielectric layer 111 and/or on the first conductive layer 121)and/or outside of the opening 111 a (e.g., on the top surface (in FIG.1G) of the first dielectric layer 111 surrounding the opening 111 a).The micro bump seed layer 126 a may, for example, be formed utilizingthe same material(s) and/or process(es) discussed herein with regard toother seed layers or conductive layers, or may be formed utilizingdifferent respective material(s) and/or process(es). The micro bump seedlayer 126 a and/or micro bump pad 126 may also be referred to herein asa conductive layer.

The micro bump pad 126 may then, for example, be formed on the microbump seed layer 126 a. In an example implementation, the first seedlayer 121 a (e.g., on which the first conductive layer 121 was formed)and the micro bump seed layer 126 a (e.g., on which the micro bump pad126 is formed) may be interposed between the first conductive layer 121and the micro bump pad 126. For example, the first seed layer 121 a andthe micro bump seed layer 126 a may be directly connected to each other,mutually facing each other. Note that in various exampleimplementations, the forming of the micro bump seed layer 126 a might beskipped, and the micro bump pad 126 formed on the first seed layer 121 aexposed through the opening 111 a (e.g., in an example implementation inwhich the first seed layer 121 a is adequately formed to be utilized insuch manner).

The micro bump pad 126 may comprise any of a variety of materials,non-limiting examples of which are provided herein. For example, themicro bump pad 126 may comprise copper, aluminum, gold, silver,palladium, general conductive material, conductive material, equivalentsthereof, combinations thereof, alloys thereof, any conductive materialdiscussed herein, etc. In an example implementation, the micro bump pad126 may comprise Ni and Au. In another example implementation, the microbump pad 126 may comprise Ni, Au, and Cu. The micro bump pad 126 may beformed utilizing any of a variety of processes, non-limiting examples ofwhich are provided herein. For example, the micro bump pad 126 may beformed utilizing one or more of an electroless plating process, anelectrolytic plating process, a sputtering process, etc.

The micro bump pad 126 is shown in FIG. 1G extending past (or protrudingfrom) the top surface of the first dielectric layer 111, but the scopeof this disclosure is not limited thereto. For example, the micro bumppad 126 may comprise a top surface that is coplanar with the top surfaceof the first dielectric layer 111, or may comprise a top surface that isbelow the top surface of the first dielectric layer 111. Thoughgenerally shown comprising a cylindrical shape, the micro bump pad 126may comprise any of a variety of geometric configurations, variousnon-limiting examples of which are provided herein.

Also note that the micro bump pad 126 may alternatively be formed in anaperture in the first dielectric layer 111 near the beginning of theoverall process shown in FIGS. 1A-1J. For example, between FIGS. 1A and1B, an aperture may be formed in the first dielectric layer 111 (if suchlayer exists) and the micro bump pad 126 may be formed on the carrier110 in such aperture before formation of the first conductive layer 121thereon.

As shown in FIG. 1H, during the attaching of the semiconductor die 130and the molding with the mold material 140, the semiconductor die 130 iselectrically connected to the micro bump pad 126 and is molded with themold material 140. For example, the conductive bump 131 (or otherconductive attachment structure, for example conductive pillar, etc.) ofthe semiconductor die 130 is electrically connected to the micro bumppad 126 through the solder 132. The conductive bump 131 of thesemiconductor die 130 may be attached to the micro bump pad 126 in anyof a variety of manners, non-limiting examples of which are presentedherein. For example, the conductive bump 131 may be soldered to themicro bump pad 126 utilizing any of a variety of solder attachmentprocesses (e.g., a mass reflow process, a thermal compression process, alaser soldering process, etc.). Also for example, the conductive bump131 may be coupled to the micro bump pad 126 utilizing a conductiveadhesive, paste, etc. In an example scenario, a solder paste may beapplied to the micro bump pad 126 utilizing a stencil and squeegee, theconductive bump 131 of the semiconductor die 130 may be positioned on orin the solder paste (e.g., utilizing a pick-and-place process), and thesolder paste may then be reflowed. After attachment of the semiconductordie 130, the assembly may be cleaned (e.g., with hot DI water, etc.),subjected to a flux clean and bake process, subjected to a plasmatreatment process, etc.

In an example implementation, an underfill 150 may be formed between thesemiconductor die 130 and the first dielectric layer 111, for examplesurrounding portions of the conductive bumps 131 and micro bump pads 126that are exposed to (and thus encapsulated by) the underfill 150. Theunderfill 150 may comprise any of a variety of underfill materials. Alsothe underfill 150 may be formed utilizing any of a variety of processes(e.g., a capillary underfilling process, utilizing a pre-appliedunderfill material, etc.). The underfill 150 between the semiconductordie 130 and the interposer 120 (as various layers are illustrativelygrouped in FIG. 1H) may, for example, prevent or reduce warpage, forexample due to thermal expansion coefficient difference between thesemiconductor die 130 and the interposer 120.

In the molding (or encapsulating) process, the semiconductor die 130and/or interposer 120 may be encapsulated with a mold material 140(e.g., a molding resin or other mold material or encapsulant), which maythen be cured. In an example implementation, the mold material 140covers the side surfaces and top surface of the semiconductor die 130.In another example implementation, the mold material 140 only covers theside surfaces of the semiconductor die 130 (or only respective portionsthereof), thus leaving the top surface of the semiconductor die 130exposed from the mold material 140. The mold material 140 may be formedin any of a variety of manners (e.g., compression molding, transfermolding, flood molding, etc.). The mold material 140 may comprise any ofa variety of types of mold material. For example, the mold material 140may comprise a resin, an epoxy, a thermosetting epoxy molding compound,a room temperature curing type, etc.

When the size of a filler (e.g., in inorganic filler or other particlecomponent) of the mold material 140 is smaller (or substantiallysmaller) than the size of a space or a gap between the interposer 120and the semiconductor die 130, the underfill 150 might not be utilized,and the mold material 140 may instead fill a space or gap between theinterposer 120 and the semiconductor die 130. In such an examplescenario, the underfilling process and the molding process may becombined into a single molding process with a molded underfill.

The semiconductor die 130, for example, may comprise any of a variety oftypes of semiconductor die, non-limiting examples of which are providedherein. For example, the semiconductor die 130 may comprise a digitalsignal processor (DSP), a microcontroller, a microprocessor, a networkprocessor, a power management processor, an audio processor, a videoprocessor, an RF circuit, a wireless baseband system-on-chip (SoC)processor, a sensor, an application specific integrated circuit, etc.Note that one or more passive electrical components may also be mountedinstead of and/or in addition to the semiconductor die 130.

As shown in FIG. 1I, during the attaching of the second wafer supportsystem (WSS) 2, the separating of the first wafer support system 1, andthe attaching of the conductive interconnection structure 160, thesecond WSS 2 may be attached to the semiconductor die 130 and/or moldmaterial 140. For example, the second WSS 2 may share any or allcharacteristics with the first WSS 1. The second WSS 2 may, for example,be attached in a same manner as the first WSS 1 (e.g., utilizing atemporary adhesive, vacuum, mechanical attachment mechanism, etc.).

After attachment of the second WSS 2, the first wafer support system 1attached to the third dielectric layer 124 is separated from the thirddielectric layer 124 and/or under bump metal 125. As discussed herein,the first WSS 1 may have been attached to the third dielectric layer 124and/or to the under bump metal 125 utilizing a temporary adhesive thatloses it adhesion (or a substantial portion thereof) when exposed tothermal energy, laser energy, chemical agents, etc. The separation ofthe first WSS 1 from the third dielectric layer 124 and/or under bumpmetal 125 may, for example, be performed by exposing the temporaryadhesive to the energy and/or chemicals that cause the adhesive toloosen. In an example scenario in which a release layer was utilized toattach a glass first WSS 1, the release layer (e.g., between theadhesive and the first WSS 1) may be subjected to laser irradiationthrough the glass first WSS 1, to effect or assist with the release ofthe first WSS 1 from the adhesive. Note that other forms of WSSattachment/detachment may be utilized (e.g., vacuum attachment,mechanical attachment, etc.). Adhesive utilized to attach the first WSS1 may, for example, be removed with a solvent if necessary.

The conductive interconnection structure 160 (or a plurality thereof)may be electrically connected to the exposed under bump metal 125 (e.g.,exposed after removal of the first WSS 1). At this point, for examplewhile the second wafer support system 2 is attached to the semiconductordie 130 and the mold material 140, the conductive interconnectionstructure 160 may be electrically connected to the under bump metal 125.

The conductive interconnection structure 160 may comprise any of avariety of characteristics, non-limiting examples of which are presentedherein. For example, the conductive interconnection structure 160 may beformed of one of a eutectic solder (Sn37Pb), a high lead solder(Sn95Pb), a lead-free solder (SnAg, SnAu, SnCu, SnZn, SnZnBi, SnAgCu,and SnAgBi), combination thereof, equivalents thereof, etc. Theconductive interconnection structure 160 (and/or any conductiveinterconnection structure discussed herein) may, for example, comprise aconductive ball (e.g., a solder ball, a copper-core solder ball, etc.),a conductive bump, a conductive pillar or post (e.g., a copper pillar, asolder-capped copper pillar, a wire, etc.), etc.

The conductive interconnection structure 160 may, for example, beconnected to the under bump metal 125 utilizing any of a variety ofreflow and/or plating processes. For example, volatile flux may bedeposited (e.g., dotted, printed, etc.) on the under bump metal 125, theconductive interconnection structure 160 may be deposited (e.g.,dropped, etc.) on the volatile flux, and then a reflow temperature ofabout 150° C. to about 250° C. may be provided. At this point, thevolatile flux may, for example, be volatized and completely removed.

The conductive interconnection structure 160, as mentioned above, may bereferred to as a conductive bump, a conductive ball, a conductivepillar, a conductive post, a conductive wire, etc., and may, forexample, be mounted on a rigid printed circuit board, a flexible printedcircuit board, a lead frame, etc. For example, the semiconductor die 130including the interposer 120 may then be electrically connected (e.g.,in a flip-chip form or similar to a flip-chip form, etc.) to any of avariety of substrates (e.g., motherboard substrates, packagingsubstrates, lead frame substrates, etc.).

As shown in FIG. 1J, during the separating of the second wafer supportsystem 2, the second wafer support system 2 attached to thesemiconductor die 130 and/or the mold material 140 is separated from thesemiconductor die 130 and/or mold material 140. For example, in thecompleted semiconductor device 100, the top surface of the semiconductordie 130 may be exposed to the outside through the top surface of themold material 140. For example, the top surface of the semiconductor die130 and the top surface of the mold material 140 may be coplanar. Inanother example implementation, the mold material 140 may cover the topsurface of the semiconductor die 130.

The interposer 120 (or package or device 100) may, for example, beformed in a mass configuration (e.g., in a wafer, panel, strip, matrix,etc.) or as a single unit. In a scenario in which the interposer 120 (orpackage or device 100) is formed in a mass configuration, after theseparating of the second wafer support system 2 (or before suchseparation), the interposer 120 and the mold material 140 may besingulated or cut (e.g., sawn by a diamond blade or laser beam,snap-separated, pull-separated, etc.). In such a scenario, the sidesurfaces of the interposer 120 and the mold material 140 may be madecoplanar by such a singulation process. In an example scenario, aplurality of the packages or devices 100 may be placed (e.g., mold sidedown) on a saw tape, and then sawed. The saw may, for example, cutthrough the packages or devices 100 and partially through the saw tape.After sawing, the packages or devices 100 may be baked. Aftersingulation, the individual packages or devices 100 may be individuallyinserted into trays (e.g., utilizing a pick and place process).

In accordance with the example illustrated provided in FIG. 1 anddiscussed herein, the present disclosure provides a semiconductor device100 (and manufacturing method thereof) comprising the interposer 120,for example without a through silicon via. Such a semiconductor device100 may, for example, be manufactured utilizing general bumpingequipment, for example without utilizing complex and expensive throughsilicon via production processes. For example, according to variousaspects of the present disclosure, a conductive layer having arelatively fine line/space/thickness may be formed first on the carrier110 (for example, a silicon wafer), and then such carrier 110 may beremoved.

Referring to FIG. 2, such figure shows a cross-sectional view of thesemiconductor device 101, in accordance with various aspects of thepresent disclosure, and referring to FIG. 3, such figure shows across-sectional view of a semiconductor device 102, in accordance withvarious aspects of the present disclosure. For illustrative clarity,only one conductive interconnection structure 160 is shown.

As shown in FIG. 2, the example semiconductor device 101 may comprise aninterposer 120, a semiconductor die 130, a mold material 140, anunderfill 150, and a conductive interconnection structure 160. Thesemiconductor device 101 may, for example, share any or allcharacteristics with any or all other semiconductor devices presentedherein (e.g., the example semiconductor device 100 shown in FIGS. 1A-1J,etc.).

The interposer 120, or general grouping of layers, may for examplecomprise a first seed layer 121 a below a first dielectric layer 111(for example, a silicon oxide layer and/or a silicon nitride layer), afirst conductive layer 121 below the first seed layer 121 a, a seconddielectric layer 122 covering the first conductive layer 121 (orportions thereof), a second seed layer 123 a below the first conductivelayer 121, a second conductive layer 123 below the second seed layer 123a, and a third dielectric layer 124 covering the second conductive layer123 (or portions thereof). The line/space/thickness of the firstconductive layer 121 may, for example, be smaller than those of thesecond conductive layer 123.

The interposer 120 may, for example, comprise a micro bump seed layer126 a extending into and/or through the first dielectric layer 111(e.g., through an opening formed therein) and on the first seed layer121 a, a micro bump pad 126 on the micro bump seed layer 126 a, an underbump seed layer 125 a below the second conductive layer 123, and anunder bump metal 125 below the under bump seed layer 125 a. In anexample implementation, the first seed layer 121 a and the micro bumpseed layer 126 a are directly and electrically connected to each other.

As discussed herein, the term “interposer” may be utilized herein toconveniently group various layers for discussion. It should beunderstood, however, that an interposer or interposer structure maycomprise any of a variety of the layers discussed herein, and is notlimited to any particular set of layers.

The conductive bump 131 is on the semiconductor die 130, and theconductive bump 131 is electrically connected to the micro bump pad 126through the solder 132. The underfill 150 is between the semiconductordie 130 and the interposer 120 (e.g., the first dielectric layer 111),and the mold material 140 surrounds side surfaces of the semiconductordie 130 and the underfill 150. In the illustrated example, since themold material 140 surrounds the only the side surfaces of thesemiconductor die 130 but does not surround (or cover) the top surface,the top surface of the semiconductor die 130 may be exposed to theoutside. Furthermore, the top surface of the semiconductor die 130 andthe top surface of the mold material 140 may be coplanar.

The conductive interconnection structure 160 may, for example, beconnected to the under bump metal 126 and may also be mounted on asubstrate as discussed herein.

Labels (1), (2), and (3) shown in FIG. 2 may, for example, show alamination and/or formation order. For example, in relation to thesemiconductor device 101, in accordance with various aspects of thepresent disclosure, the interposer 120 is formed in the direction (1)(e.g., building from the first dielectric layer 111), and then thesemiconductor die 130 is connected to the interposer 120 in thedirection (2) (e.g., building from the interposer 120), and then theconductive interconnection structure 160 is attached to the interposer120 in the direction (3) (e.g., building from the interposer 120).

As discussed herein, the mold material 140 may surround (or cover) thetop surface of the semiconductor die 130. An example semiconductordevice 102 in this configuration is shown in FIG. 3. The examplesemiconductor device 102 may, for example, share any or allcharacteristics with any or all example semiconductor devices discussedherein (e.g., the semiconductor device 100, the semiconductor device101, etc.). For example, in the example semiconductor device 102, themold material 141 may completely cover the top surface in addition tothe side surfaces of the semiconductor die 130. Since the semiconductordie 130 is generally surrounded at top and side surfaces by the moldmaterial 141, the semiconductor die 130 may be protected from anexternal environment.

Also, in comparison to the semiconductor device 100 discussed withregard to FIGS. 1A-1J, the example semiconductor devices 101 and 102each comprise a pad 126 (e.g., a micro bump pad) that is wider at a topend (e.g., to be connected with a conductive bump 131 of thesemiconductor die 130) than at a bottom end (e.g., extending through thefirst dielectric layer 111). For example, rather than beingcylindrically shaped as shown in the micro bump pad 126 of FIGS. 1G-1J,the micro bump pad 126 may be cup-shaped or mushroom-shaped (e.g., withsloped stem sidewalls or vertical stem sidewalls). The micro bump pad126 is also illustrated with vertical cap sidewalls.

Referring to FIG. 4, a cross-sectional view of a semiconductor device103 in accordance with various aspects of the present disclosure isshown. The example semiconductor device 103 may, for example, share anyor all characteristics with the other example semiconductor devicesdiscussed herein (e.g., semiconductor device 100, semiconductor device101, semiconductor device 102, etc.).

As shown in FIG. 4, the first conductive layer 121 of the examplesemiconductor device 103 may be formed at the outside of a mounting area(or footprint) of the semiconductor die 130, and a ball pad 127 may beformed on the first conductive layer 121. For example, a ball padopening (or aperture) may be formed through the first dielectric layer111, for example in a same manner as other openings discussed herein(e.g., by ablation, etching, etc.). A pad seed layer 127 a may be formedin and/or around the ball pad opening (or aperture), for example in asame manner as other seed layers discussed herein. The ball pad 127 maythen be formed on the ball pad seed layer 127 a. The ball pad seed layer127 a may, for example, be directly connected to the first seed layer121 a.

After forming the mold material 141, a through mold via 142 (TMV) may beformed through the mold material 141 to expose the ball pad 127. Theconductive ball 128 may then, for example, be formed in the through moldvia 142 and connected to the ball pad 127 (e.g., electrically and/ormechanically connected to the ball pad 127). The conductive ball 128 maybe exposed to the outside of the mold material 141 through the throughmold via 142. Accordingly, an additional semiconductor device orcomponent (not shown) may be electrically connected to the semiconductordevice 103 utilizing the conductive ball 128. Note that in analternative implementation, the conductive ball 128 may be molded intothe mold material 141 and then exposed by forming the TMV to expose theconductive ball 128.

Though the example semiconductor device 103 comprises a conductive ball128, any of a variety of interconnection structures may be utilized(e.g., conductive bumps, conductive pillars or posts, wires, etc.).Also, though the example semiconductor device 103 is illustrated withthe mold material 141 covering the top surface of the semiconductor die130, the top surface of the semiconductor die 130 may also be exposedfrom the mold material 141, for example as illustrated for othersemiconductor devices herein.

Referring now to FIG. 5, such figure shows a cross-sectional view of asemiconductor device 104, in accordance with various aspects of thepresent disclosure. The example semiconductor device 104 may, forexample, share any or all characteristics with the other examplesemiconductor devices discussed herein (e.g., semiconductor devices 100,101, 102, 103, etc.).

As shown in FIG. 5, the first conductive layer 121 of the semiconductordevice 104 may be formed at the outside of a mounting area (orfootprint) of the semiconductor die 130, and a metal pillar 129 may beformed on the first conductive layer 121. For example, a pillar opening(or aperture) may be formed through the first dielectric layer 111, forexample in a same manner as other openings discussed herein (e.g., byablation, etching, etc.). A pillar seed layer 129 a may be formed inand/or around the pillar opening (or aperture), for example in a samemanner as other seed layers discussed herein.

After forming the mold material 141, a through mold via 142 (TMV) may beformed through the mold material 141 to expose the pillar seed layer 129a. The metal pillar 129 may then, for example, be formed on the pillarseed layer 129 a. The metal pillar 129 may, for example, be formed inany of a plurality of manners (e.g., by plating, by pasting andreflowing, by wiring, etc.). The pillar seed layer 129 a may, forexample, be directly connected to the first seed layer 121 a.Furthermore, a metal pad 171 may be formed on the metal pillar 129(e.g., with or without a metal pad seed layer 171 a). Accordingly, anadditional semiconductor device or component (not shown) may beelectrically connected to the semiconductor device 104.

Note that the orders of operation are merely examples, and the scope ofthe disclosure should not be limited thereto. For example, referring tothe example semiconductor device 104 shown in FIG. 5, the metal pillar129 may be formed before the mold material 149. Also note that, thepillar seed layer 129 a need not necessarily be formed. For example, inan example implementation, the metal pillar 129 may be formed on thefirst seed layer 121 a (e.g., on a surface of the first seed layer 121 aopposite the surface on which the first conductive layer 121 is formed).

Referring now to FIG. 6, such figure shows a cross-sectional view of asemiconductor device 105, in accordance with various aspects of thepresent disclosure. The example semiconductor device 105 may, forexample, share any or all characteristics with the other examplesemiconductor devices discussed herein (e.g., semiconductor devices 100,101, 102, 103, 104, etc.).

As shown in FIG. 6, an additional conductive layer 181 (e.g., aredistribution layer) may be further formed on a metal pillar 129. Theadditional conductive layer 181 may, for example, share any or allcharacteristics with any conductive layer discussed herein.Additionally, the metal pillar 129 may, for example, share any or allcharacteristics with any metal pillar or conductive interconnectionstructure discussed herein (e.g., the metal pillar 129 of FIG. 5, etc.).

For example, a first additional dielectric layer 191, which may also bereferred to herein as a passivation layer, is formed on the moldmaterial 141 around the metal pillar 129. The first additionaldielectric layer 191 may, for example, share any or all characteristicswith any dielectric layer discussed herein. The additional conductivelayer 181 is connected to the metal pillar 129 via an opening (oraperture) in the first additional dielectric layer 191 and is furtherformed on the first additional dielectric layer 191. Note that theadditional conductive layer 181 may be formed on an additional seedlayer 191 a, which may for example share any or all characteristics withany seed layer discussed herein.

The additional conductive layer 181 is then covered by the secondadditional dielectric layer 192, and an opening 192 a is formed in apredetermined area of the second additional dielectric layer 192. Thesecond additional dielectric layer 192 may, for example, share any orall characteristics with any other dielectric layer discussed herein. Aspecific area of the additional conductive layer 181 may, for example,be exposed to the outside through the opening 192 a. Accordingly, anadditional conductive layer 181 (e.g., which may also be referred toherein as a redistribution layer) may be formed on the top surface ofthe mold material 141 and an additional semiconductor device orcomponent (not shown) may be electrically connected to the additionalconductive layer 181.

Herein, the structures (or any portion thereof) of the semiconductordevices 100, 101, 102, 103, 104 and 105 shown in FIGS. 1A-1J, 2, 3, 4,5, and 6, respectively, may be applied to structures of the varioussemiconductor devices to be described below, and the present disclosureis not limited to a specific structure of a semiconductor device.Similarly, the method of forming such structure may also be utilized inconjunction with any of the example methods disclosed herein.

Turning next to FIGS. 7A to 7H, such figures show cross-sectional viewsillustrating a method of manufacturing a semiconductor device 200, inaccordance with various aspects of the present disclosure. The examplesemiconductor devices and/or methods illustrated at FIGS. 7A to 7H may,for example, share any or all characteristics with any or all of theother example semiconductor devices and/or methods presented herein(e.g., with regard to FIGS. 1A to 1J, FIGS. 2-6, etc.).

The example method of manufacturing the semiconductor device 200 may,for example, comprise providing a carrier 210 with a first dielectriclayer 211, forming a first conductive layer 221, attaching asemiconductor die 230 and molding with a mold material 240, attaching awafer support system 1 and removing the carrier 240, forming an opening211 a through the first dielectric layer 211, forming a secondconductive layer 225 and an under bump metal 227, attaching a conductiveinterconnection structure 260, and separating the wafer support system1.

As shown in FIG. 7A, during the providing of the carrier 210 with thefirst dielectric layer 211, the carrier 210, such as, for example, asilicon wafer with a planar top surface and a planar bottom surface, isprovided. The carrier 210 and/or the providing or forming thereof may,for example, share any or all characteristics with any carrier and/orthe providing or forming thereof discussed herein (e.g., the carrier 110of FIGS. 1-6, etc.).

The first dielectric layer 211, such as a silicon oxide layer and/or asilicon nitride layer, may be formed on the surface of a silicon waferthrough an oxidation process. The first dielectric layer 211, and theproviding or forming thereof, may for example share any or allcharacteristics with any dielectric layer discussed herein (e.g., thefirst dielectric layer 111 of FIGS. 1-6, etc.). The first dielectriclayer 211 may also be referred to herein as a protective layer.

As shown in FIG. 7B, during the forming of the first conductive layer221, which may also be referred to as a redistribution layer, the firstconductive layer 221 may be formed on the first dielectric layer 211.The first conductive layer 221 and/or the forming thereof may, forexample, share any or all characteristics with any other conductivelayer and/or the forming thereof discussed herein (e.g., with regard toFIGS. 1-6, etc.). In one example implementation, a first seed layer 221a (see, e.g., FIG. 8) is formed on the first dielectric layer 211, andthe first conductive layer 221 is formed on the first seed layer 221 a.The first conductive layer 221 may then be covered with a seconddielectric layer 222. The second dielectric layer 222, and/or theforming thereof may, for example, share any or all characteristics withany other dielectric layer and/or the forming thereof discussed herein(e.g., with regard to FIGS. 1-6, etc.).

The forming of the first conductive layer 221 (e.g., with or without aseed layer 221 a) and the second dielectric layer 222 may be repeatedany number of times (e.g., utilizing the same materials and/or processesor different respective materials and/or processes). The exampleillustrations in FIGS. 7B-7H show two formations of such layers. Assuch, the layers are provided with similar labels in the figures (e.g.,repeating the first conductive layer 221 and the second dielectric layer222).

Additionally, an opening 222 a (or aperture) may be formed in the seconddielectric layer 222 corresponding to the first conductive layer 221 (ora portion thereof). The opening 222 a and/or the forming thereof, mayshare any or all characteristics with other openings and/or the formingthereof discussed herein. For example, the opening 222 a may share anyor all characteristics with the opening 122 a discussed herein (e.g.,with regard to FIGS. 1-6, etc.).

A micro bump pad 223 (or other pad, landing, or attachment structure)may, for example, be formed in the opening 222 a. The micro bump pad 223and/or the forming thereof may, for example, share any or allcharacteristics with other pads discussed herein (e.g., the micro bumppad 126 of FIGS. 1-6, etc.). For example, a micro bump seed layer 223 a(see, e.g., FIG. 8) may be formed on (e.g., directly on) the firstconductive layer 221 exposed through the opening 222 a, and the microbump pad 223 may be formed on the micro bump seed layer 223 a. The microbump seed layer 223 a and/or micro bump pad 223 may also be referred toherein conductive layers.

As discussed herein (e.g., with regard to FIGS. 1-6, etc.), in anexample implementation, since the first conductive layer 221 (e.g., withor without an underlying seed layer 221 a) may be formed on theinorganic first dielectric layer 211, it may be formed (or more easilyformed) to have a finer line/space/thickness in comparison to otherconductive layers, which may be formed on organic dielectric layers.

As shown in FIG. 7C, during the attaching of the semiconductor die 230and the molding with the mold material 240, the semiconductor die 230 iselectrically connected to the micro bump pad 223 and is molded with themold material 240. The semiconductor die 230 and/or the attachingthereof may share any or all characteristics with other semiconductordies and/or the attaching thereof discussed herein (e.g., thesemiconductor die 130 and/or the attaching thereof discussed herein withregard to FIGS. 1-6, etc.).

For example, the conductive bump 231 (or other conductive attachmentstructure) of the semiconductor die 230 is electrically connected to themicro bump pad 223 through the solder 232. The conductive bump 231 ofthe semiconductor die 230 may be attached to the micro bump pad 223 (orother pad or landing structure) in any of a variety of manners,non-limiting examples of which are presented herein. For example, theconductive bump 231 may be soldered to the micro bump pad 223 utilizingany of a variety of solder attachment processes (e.g., a mass reflowprocess, a thermal compression process, etc.). Also for example, theconductive bump 231 may be coupled to the micro bump pad 223 utilizing aconductive adhesive, paste, etc.

In an example implementation, an underfill 250 may be formed between thesemiconductor die 230 and the interposer 220 (e.g., the seconddielectric layer 222), for example, surrounding portions of theconductive bumps 231 and micro bump pads 223 that are exposed to theunderfill 250. The underfill 250 and/or the formation thereof, may shareany or all characteristics with other underfills and/or the formationthereof discussed herein (e.g., the underfill 150 discussed herein withregard to FIGS. 1-6, etc.). The underfill 250 may comprise any of avariety of underfill materials. Also the underfill 250 may be formedutilizing any of a variety of processes (e.g., a capillary underfillingprocess, utilizing a pre-applied underfill material, etc.). The underfill 250 between the semiconductor die 230 and the interposer 220 (asvarious layers are illustratively group in FIGS. 7F-7H) may, for exampleprevent or reduce warpage, for example due to thermal expansioncoefficient difference between the semiconductor die 230 and theinterposer 220.

In the molding process, the semiconductor die 230 and/or interposer 220may be encapsulated with a mold material 240 (e.g., a molding resin orother mold material). The mold material 240 and/or the forming thereofmay, for example, share any or all characteristics with other moldmaterials and/or the forming thereof discussed herein (e.g., the moldmaterial 140 discussed herein with regard to FIGS. 1-6, etc.). In anexample implementation, the mold material 240 covers the side surfacesand top surface of the semiconductor die 230. In another exampleimplementation, the mold material 240 only covers the side surfaces ofthe semiconductor die 230 (or only respective portions thereof), thusleaving the top surface of the semiconductor die 230 exposed from themold material 240. The mold material 240 may be formed in any of avariety of manners (e.g., compression molding, transfer molding, floodmolding, etc.). The mold material 240 may comprise any of a variety oftypes of mold material. For example, the mold material 240 may comprisea resin, an epoxy, a thermosetting epoxy molding compound, a roomtemperature curing type, etc. As discussed herein, the mold material 240may also be utilized to form a molded underfill, for example instead ofthe underfill 250.

As shown in FIG. 7D, during the attaching of the wafer support system 1and the removing of the carrier 210, the wafer support system 1 isattached to the top surfaces of the semiconductor die 230 and the moldmaterial 240, and the carrier 210 (for example, a silicon wafer) belowthe first dielectric layer 211 is removed, for example, through agrinding process and/or an etching process. The wafer support system 1and/or the attachment thereof may, for example, share any or allcharacteristics with other wafer support systems discussed herein (e.g.,the example first wafer support system 1 and/or second wafer supportsystem 2 discussed herein with regard to FIGS. 1-6, etc.). Additionally,the removing of the carrier 210 may, for example, share any or allcharacteristics with any carrier removal discussed herein (e.g., theremoval of the carrier 110 discussed herein with regard to FIGS. 1-6,etc.). In an example implementation, after removal of the carrier 210,only the first dielectric layer 211 remains on the bottom surfaces ofthe first redistribution layer 221 and the second dielectric layer 222.

As shown in FIG. 7E, during the forming of the openings 211 a (orapertures) in the first dielectric layer 211, a plurality of openings211 a are selectively formed in the first dielectric layer 211. Theopenings 211 a and/or the forming thereof may, for example, share any orall characteristics with other openings and/or the forming thereofdiscussed herein (e.g., with regard to FIGS. 1-6, etc.). For example,the openings 211 a may be formed in any of a variety of manners (e.g.,mechanical and/or laser ablation, chemical etching, photo etchingprocess, etc.). Each of the openings 211 a may, for example, correspondto a respective specific area of the first conductive layer 221 exposedto the outside by the opening 211 a. In an example implementation, anopening 211 a exposes a respective specific area of the first conductivelayer 221 to the outside through the inorganic first dielectric layer211. In an example implementation in which the first conductive layer221 was formed on a first seed layer 221 a, a specific area of the firstseed layer 221 a on which the first conductive layer 221 was formed isexposed to the outside through the inorganic first dielectric layer 211.

The example illustration of FIG. 7E also shows a third dielectric layer224 formed on (e.g., directly on) the first dielectric layer 211. Such athird dielectric layer 224 and/or the forming thereof may share any orall characteristics with the other dielectric layers or the formingthereof discussed herein (e.g., with regard to FIGS. 1-6, etc.). In anexample scenario, the third dielectric layer 224 may comprise an organiclayer, and the first dielectric layer 211 may comprise an inorganiclayer. In such an example implementation, the openings 211 a may beformed through both the third dielectric layer 224 and the firstdielectric layer 211 in a same forming process.

As shown in FIG. 7F, during the forming of the second conductive layer225 and the under bump metal 227, the second conductive layer 225 andunder bump metal 227 of at least one layer are formed below the firstconductive layer 221 and/or below the third dielectric layer 224.

In one example implementation, a second seed layer 225 a (see, e.g.,FIG. 8) is formed at the inside of the opening 211 a (e.g., on sidewalls of the opening 211 a formed in the first 211 and/or thirddielectric layers 224, and/or on the first conductive layer 221) and/oroutside of the opening 211 a (e.g., on the bottom surface of the thirddielectric layer 224 around and/or extending from the opening 211 a).The second seed layer 225 a may also be referred to herein as aconductive layer. In an example implementation, the second seed layer225 a may be formed directly on the first seed layer 221 a. In variousexample implementations, however, forming the second seed layer 225 amay be skipped and the second conductive layer 225 formed on the firstseed layer 221 a.

Continuing the example implementation, the second conductive layer 225is formed on the second seed layer 225 a. For example, the secondconductive layer 225 may be formed to fill (or at least cover sidesurfaces of) the opening 211 a in the third dielectric layer 224 and/orin the first dielectric layer 211. The second conductive layer 225 may,for example, be formed using the same material(s) and/or processes asother conductive layers presented herein (e.g., the first conductivelayer 121 of FIGS. 1-6, etc.), or may be formed using differentrespective material(s) and/or process(es). The second conductive layer225 may also be referred to herein as a redistribution layer.

The second conductive layer 225 may then, for example, be covered withthe fourth dielectric layer 226, The fourth dielectric layer 226 may,for example, be formed utilizing the same material(s) and/or process(es)as utilized to form the second 222 and third 224 dielectric layers, ormay be formed utilizing different respective material(s) and/orprocess(es).

Formation of the third dielectric layer 224 and the second conductivelayer 225 (e.g., with or without a seed layer 225 a) may be repeated anynumber of times (e.g., utilizing the same materials and/or processes ordifferent respective materials and/or processes). The exampleillustrations in FIGS. 7F-7H show two formations of such layers. Assuch, the layers are provided with similar labels in the figures (e.g.,repeating the third dielectric layer 224 and the second conductive layer225).

An opening 224 a (or aperture) may, for example, be formed in the fourthdielectric layer 226, and a specific area of the second conductive layer225 may be exposed to the outside through the opening 224 a. As with allopenings discussed herein, the opening 224 a may be formed in any of avariety of manners (e.g., mechanical and/or laser ablation, chemicaletching, masking during formation of the dielectric layer, etc.).

An under bump seed layer 227 a (see, e.g., FIG. 8) may, for example, beformed at the inside of the opening 224 a (e.g., on side walls of theopening 224 a formed in the fourth dielectric layer 226 and/or on thesecond conductive layer 225 exposed by the opening 224 a) and/or outsideof the opening 224 a (e.g., on the bottom surface of the fourthdielectric layer 226, for example around and/or encircling the opening224 a). As discussed herein, the under bump seed layer 227 a may beformed using the same material(s) and/or process(es) as used to form anyof the seed layers discussed herein (e.g., the first seed layer 121 a,the second seed layer 123 a, and/or the under bump seed layer 125 a ofFIGS. 1-6, etc.), or may be formed using different respectivematerial(s) and/or process(es). The under bump seed layer 227 a (or anyseed layer discussed herein) may also be referred to herein as aconductive layer.

An under bump metal 227 is formed on the under bump seed layer 227 a.The under bump metal 227 and/or the forming thereof may share any or allcharacteristics with other under bump metals and/or the forming thereofdiscussed herein (e.g., the under bump metal 125 of FIGS. 1-6, etc.).

For discussion purposes herein, the first conductive layer 221, thesecond dielectric layer 222, the second conductive layer 225, the thirddielectric layer 224, and the fourth dielectric layer 226 may beconsidered to be components of an interposer 220. Furthermore, the microbump pad 223 and under bump metal 227 may also be considered to becomponents of the interposer 220.

As shown in FIG. 7G, during the attaching of the conductiveinterconnection structure 260, the conductive interconnection structure260 may be electrically connected to the under bump metal 227. At thispoint, for example while the wafer support system 1 is attached to thesemiconductor die 230 and the mold material 240, the conductiveinterconnection structure 260 may be electrically connected to the underbump metal 227. The conductive interconnection structure 260 and/ormethod of attaching thereof may, for example, share any or allcharacteristics with any conductive interconnection structure and/ormethod of attaching thereof discussed herein (e.g., the conductiveinterconnection structure 160 of FIGS. 1-6, etc.).

As shown in FIG. 7H, during the separating of the wafer support system1, the wafer support system 1 attached to the semiconductor die 230and/or the mold material 240 is separated from the semiconductor die 230and/or mode material 240. The wafer support system 1 and/or the methodof separating thereof may, for example, share any or all characteristicswith any other wafer support system and/or method of separating thereofdiscussed herein (e.g., the first wafer support system 1 and/or secondwafer support system 2 of FIGS. 1-6, etc.).

In the completed example semiconductor device 200, the top surface ofthe semiconductor die 230 may, for example, be exposed to the outsidethrough the top surface of the mold material 240. For example, the topsurface of the semiconductor die 230 and the top surface of the moldmaterial 240 may be coplanar. In another example implementation, themold material 240 may cover the top surface of the semiconductor die230.

As with any or all of the examples discussed herein (e.g., with regardto FIGS. 1-6, etc.), the interposer 220 (or package 200) may, forexample, be formed in a mass configuration or as a single unit. Asdiscussed herein, in an example scenario in which the interposer 220 (orpackage 200) is formed in a mass configuration, a singulation processmay be performed.

Referring to FIG. 8, such figure shows a cross-sectional viewillustrating a semiconductor device 201, in accordance with variousaspects of the present disclosure.

As shown in FIG. 8, the example semiconductor device 201 may comprise aninterposer 220, a semiconductor die 230, a mold material 240, anunderfill 250, and a conductive interconnection structure 260. Thesemiconductor device 201 may, for example, share any or allcharacteristics with the example semiconductor device 200 shown in FIGS.7A-7H, and/or with any other semiconductor device presented herein(e.g., with respect to FIGS. 1-6, etc.).

The interposer 220, for example, comprises a first seed layer 221 a on afirst dielectric layer 211 (for example, a silicon oxide layer and/or asilicon nitride layer), a first conductive layer 221 on the first seedlayer 221 a, a second dielectric layer 222 covering the first conductivelayer 221, a second seed layer 225 a below the first dielectric layer211 and directly connected to the first seed layer 221 a, a secondconductive layer 225 below the second seed layer 225 a, and a thirddielectric layer 224 covering the second conductive layer 225. Theline/space/thickness of the first conductive layer 221 may, for example,be smaller than those of the second conductive layer 225.

The interposer 220, or general grouping of layers, may for examplecomprise a micro bump seed layer 223 a extending into and/or through thesecond dielectric layer 222 (e.g., via an opening formed therein) and onthe first conductive layer 221, a micro bump pad 223 on the micro bumpseed layer 223 a, an under bump seed layer 227 a below the secondconductive layer 225, and an under bump metal 227 below the under bumpseed layer 227 a. In an example implementation, the first seed layer 221a and the second seed layer 225 a are directly and electricallyconnected to each other.

The conductive bump 231 is on the semiconductor die 230, and theconductive bump 231 is electrically connected to the micro bump pad 223through the solder 232. The underfill 250 is between the semiconductordie 230 and the interposer 220 (e.g., the second dielectric layer 222),and the mold material 240 surrounds side surfaces of the semiconductordie 230 and the underfill 250. In the illustrated example, the moldmaterial 240 surrounds the side surfaces of the semiconductor die 230and also the top surface thereof.

The conductive interconnection structure 260 may, for example, beconnected to the under bump metal 227 and may also be mounted on asubstrate as discussed herein.

Labels (1) and (2) shown in FIG. 8 may, for example, show a laminationand/or formation order. For example, in relation to the semiconductordevice 201, in accordance with various aspects of the presentdisclosure, a first portion of the interposer 220 is formed in thedirection (1) (e.g., building from the first dielectric layer 211) andthe semiconductor die 230 is electrically connected to such firstportion, and then the second remaining portion of the interposer 220 isformed in the direction (2) (e.g., building from the first dielectriclayer 211) and the conductive interconnection structure 260 is attachedto such second remaining portion.

Referring to FIGS. 9A to 9J, such figures show cross-sectional viewsillustrating a method of manufacturing a semiconductor device 300, inaccordance with various aspects of the present disclosure. The examplesemiconductor devices and/or methods illustrated at FIGS. 9A to 9J may,for example, share any or all characteristics with any or all of theother example semiconductor devices and/or methods presented herein(e.g., with regard to FIGS. 1A to 1J, FIGS. 2-6, FIGS. 7A-7H, FIG. 8,etc.).

The example method of manufacturing the semiconductor device 300 may,for example, comprise providing a carrier 310 with a first dielectriclayer 311, forming a first conductive layer 321, forming a secondconductive layer 323, forming a micro bump pad 325, attaching asemiconductor die 330 and molding with a mold material 340, attaching awafer support system 1, removing the carrier 310, forming an opening 311a in the first dielectric layer 311, forming an under bump metal 327 inand/or around the opening 311 a, connecting a conductive interconnectionstructure 360, and separating the wafer support system 1.

As shown in FIG. 9A, during the forming or providing of the carrier 310with the first dielectric layer 311, the carrier 310, such as, forexample, a silicon wafer with a planar top surface and a planar bottomsurface, is provided. The carrier 310, and the providing or formingthereof, may for example share any or all characteristics with anycarrier and discussed herein (e.g., the carrier 110 of FIGS. 1-6, thecarrier 210 of FIGS. 7-8, etc.).

The first dielectric layer 311, such as a silicon oxide layer and/or asilicon nitride layer, may be formed on the surface of a silicon waferthrough an oxidation process. The first dielectric layer 311, and theproviding or forming thereof, may for example share any or allcharacteristics with any dielectric layer discussed herein (e.g., thefirst dielectric layer 111 of FIGS. 1-6, the first dielectric layer 211of FIGS. 7-8, etc.). The first dielectric layer 311 may also be referredto herein as a protective layer.

As shown in FIG. 9B, during the forming of the first conductive layer321, which may also be referred to as a redistribution layer, the firstconductive layer 321 may be formed on the first dielectric layer 311.The first conductive layer 321 and/or the forming thereof may share anyor all characteristics with other conductive layers discussed herein(e.g., with regard to FIGS. 1-8, etc.). In one example implementation, afirst seed layer 321 a (see, e.g., FIG. 10) is formed on the firstdielectric layer 311, and the first conductive layer 321 is formed onthe first seed layer 321 a.

The first conductive layer 321 may then be covered with a seconddielectric layer 322. The second dielectric layer 322, and/or theforming thereof may, for example, share any or all characteristics withany other dielectric layer, and/or the forming thereof discussed herein(e.g., with regard to FIGS. 1-8, etc.).

The forming of the first conductive layer 321 (e.g., with or without aseed layer 321 a) and the second dielectric layer 322 may be repeatedany number of times (e.g., utilizing the same materials and/or processesor different respective materials and/or processes). The exampleillustrations in FIGS. 9C-9J show two formations of such layers. Assuch, the layers are provided with similar labels in the figures (e.g.,repeating the first conductive layer 321 and the second dielectric layer322).

In the example illustrated in FIG. 9, since the conductiveinterconnection structure 360 is later connected to the first conductivelayer 321, the line/space/thickness of the first conductive layer 321may, for example, be formed larger in comparison to theline/space/thickness of the second conductive layer 323 discussed below.The scope of this disclosure, however, is not limited to such relativedimensions.

As shown in FIG. 9C, during the forming of the second conductive layer323, the second conductive layer 323 is formed on the first conductivelayer 321 and/or on the second dielectric layer 322. In an exampleimplementation, a second seed layer 323 a (see, e.g., FIG. 10) is formedon a top surface of the second dielectric layer 322 and/or in an opening(or aperture) thereof extending through the second dielectric layer 322to the first conductive layer 321, a second conductive layer 323 isformed on the second seed layer 323 a, and the second conductive layer323 is covered with the third dielectric layer 324. Also, an opening 324a may be formed in the third dielectric layer 324 so that a specificarea of the second conductive layer 323 corresponding to the opening 324a is exposed to the outside. The second conductive layer 323, the thirddielectric layer 324, and/or openings (or apertures) therein, and/or theformation thereof, may share any or all characteristics with the otherconductive layers, dielectric layers, and openings, and the formationthereof discussed herein (e.g., with regard to FIGS. 1-8, etc.). Forexample, such formation may be repeated any number of times.

As shown in FIG. 9D, during the forming of the micro bump pad 325 (orother pad, land, attachment structure, die attachment structure, etc.)in the opening 324 a, the micro bump pad 325 is formed in the opening324 a so that the micro bump pad 325 is electrically connected to thesecond conductive layer 323. In an example implementation, a micro bumpseed layer 325 a (see, e.g., FIG. 10) is formed at the inside of theopening 324 a (e.g., on the second conductive layer 323 exposed by theopening 324 a and/or on side walls of the opening 324 a) and/or outsideof the opening 324 a (e.g., on the top surface (in FIG. 9D) of the thirddielectric layer 324). The micro bump seed layer 325 a may, for example,be formed utilizing the same material(s) and/or process(es) discussedherein with regard to other seed layers, or may be formed utilizingdifferent respective material(s) and/or process(es). The micro bump seedlayer 325 a and/or micro bump pad 325 may also be referred to herein asa conductive layer.

The micro bump pad 325 may then, for example, be formed on the microbump seed layer 325 a. For example, in an example implementation, themicro bump seed layer 325 a is interposed between the second conductivelayer 323 and the micro bump pad 325. The micro bump pad 325 and/or theforming thereof may, for example, share any or all characteristics withany other pad or micro bump pad and/or the forming thereof discussedherein (e.g., with regard to FIGS. 1-6, FIGS. 7-8, etc.). The micro bumpseed layer 325 a and/or micro bump pad 325 may also be referred toherein as a conductive layer.

Though not illustrated in FIGS. 9A-9J, following formation of the underbump metal 325, an edged trim (or profile) process may be performed, forexample in which an edge of the wafer being processed is trimmed (orprofiled). Such trimming may be performed in a variety of manners, forexample by grinding. Such edge trimming may, for example, protect thewafer from chipping and flaking during subsequent processing.

As shown in FIG. 9E, during the attaching of the semiconductor die 330and the molding with the mold material 340, the semiconductor die 330 iselectrically connected to the micro bump pad 325 and is molded with themold material 340. The semiconductor die 330 and/or the attachingthereof may share any or all characteristics with other semiconductordies and/or the attaching thereof discussed herein (e.g., with regard toFIGS. 1-6, FIGS. 7-8, etc.). For example, in an example scenario, asolder paste may be applied to the micro bump pad 326 utilizing astencil and squeegee, the conductive bump 331 of the semiconductor die330 may be positioned on or in the solder paste (e.g., utilizing apick-and-place process), and the solder paste may then be reflowed.After attachment of the semiconductor die 330, the assembly may becleaned (e.g., with hot DI water, etc.), subjected to a flux clean andbake process, subjected to a plasma treatment process, etc.

For example, the conductive bump 331 (or other conductive attachmentstructure) of the semiconductor die 330 is electrically connected to themicro bump pad 325 through the solder 332. The conductive bump 331 ofthe semiconductor die 330 may be attached to the micro bump pad 325 (orother pad or landing structure) in any of a variety of manners,non-limiting examples of which are presented herein. For example, theconductive bump 331 may be soldered to the micro bump pad 325 utilizingany of a variety of solder attachment processes (e.g., a mass reflowprocess, a thermal compression process, etc.). Also for example, theconductive bump 331 may be coupled to the micro bump pad 325 utilizing aconductive adhesive, paste, etc.

In an example implementation, an under fill 350 may be formed betweenthe semiconductor die 330 and the interposer 320 (e.g., the thirddielectric layer 324), for example, surrounding portions of theconductive bumps 331 and micro bump pads 325 that are exposed to theunderfill 350. The underfill 350, or the formation thereof, may shareany or all characteristics with other underfills discussed herein (e.g.,with regard to FIGS. 1-6, FIGS. 7-8, etc.).

In the molding process, the semiconductor die 330 and/or interposer 320may be encapsulated with a mold material 340 (e.g., a molding resin orother mold material or encapsulant), which may then be cured. The moldmaterial 340 and/or the forming thereof, may share any or allcharacteristics with other mold materials and/or the forming thereofdiscussed herein (e.g., with regard to FIGS. 1-6, FIGS. 7-8, etc.). Inan example implementation, the mold material 340 covers the sidesurfaces and top surface of the semiconductor die 330. In anotherexample implementation, the mold material 340 only covers the sidesurfaces of the semiconductor die 330 (or only respective portionsthereof), thus leaving the top surface of the semiconductor die 330exposed from the mold material 340. As discussed herein, the moldmaterial 340 may also be utilized to form a molded underfill, forexample instead of the underfill 350.

As shown in FIG. 9F, during the attaching of the wafer support system 1,the wafer support system 1 is attached to the top surfaces of thesemiconductor die 330 and the mold material 340. In another exampleimplementation, when the mold material 340 covers the top surface of thesemiconductor die 330, the wafer support system 1 is attached to the topsurface of the mold material 340. The wafer support system 1 and/or theattachment thereof may, for example, share any or all characteristicswith other wafer support systems and/or the attachment thereof discussedherein (e.g., with regard to FIGS. 1-6, FIGS. 7-8, etc.).

As shown in FIG. 9G, during the removing of the carrier 310, the carrier310 (for example, a silicon wafer) attached to the first dielectriclayer 311 is removed. For example, most or all of the carrier 310 may beremoved through a mechanical grinding process and then, any remainingcarrier 310 may be removed completely through a chemical etchingprocess. The removing of the carrier 310 may, for example, share any orall characteristics with any carrier removal discussed herein (e.g.,with regard to FIGS. 1-6, FIGS. 7-8, etc.). In an exampleimplementation, after removal of the carrier 310 only the firstdielectric layer 311 (for example, a silicon oxide layer and/or asilicon nitride layer) originally formed or provided on the surface ofthe carrier 310 remains.

As shown in FIG. 9H, during the forming of the openings 311 a (orapertures) in the first dielectric layer 311, a plurality of openings311 a are selectively formed in the first dielectric layer 311. Theopenings 311 a and/or the forming thereof may, for example, share any orall characteristics with other openings and/or the forming thereofdiscussed herein (e.g., with regard to FIGS. 1-6, FIGS. 7-8, etc.). Forexample, the openings 311 a may be formed in any of a variety of manners(e.g., mechanical and/or laser ablation, chemical etching, photo etchingprocess, photo-masking and etching process, etc.). Each of the openings311 a may, for example, correspond to a respective specific area of thefirst conductive layer 321 exposed to the outside by the opening 311 a.In an example implementation, an opening 311 a exposes a respectivespecific area of the first conductive layer 321 to the outside throughthe inorganic first dielectric layer 311. In an example implementationin which the first conductive layer 321 was formed on a first seed layer321 a, a specific area of the first seed layer 321 a on which the firstconductive layer 321 was formed is exposed to the outside through theinorganic first dielectric layer 311.

The example illustration of FIG. 9H also shows a fourth dielectric layer326 formed on (e.g., directly on) or under the first dielectric layer311. Such a fourth dielectric layer 326 and/or the forming thereof mayshare any or all characteristics with the other dielectric layers and/orthe forming thereof discussed herein (e.g., with regard to FIGS. 1-6,FIGS. 7-8, etc.). In an example implementation, the fourth dielectriclayer 326 may comprise an organic layer, and the first dielectric layer311 may comprise an inorganic layer. In such an example implementation,the openings 311 a may be formed through both the fourth dielectriclayer 326 and the first dielectric layer 311 in a same forming process.

As shown in FIG. 91, the under bump metal 327 is formed in and/or on theopening 311 a, and the conductive interconnection structure 360 isattached to the under bump metal 327. The under bump metal 327 and/orthe forming thereof may share any or all characteristics with otherunder bump metals and/or the forming thereof discussed herein (e.g.,with regard to FIGS. 1-6, FIGS. 7-8, etc.). Additionally, the conductiveinterconnection structure 360 and/or the attachment thereof may shareany or all characteristics with other conductive interconnectionstructures and/or the attachment thereof discussed herein (e.g. withregard to FIGS. 1-6, FIGS. 7-8, etc.).

For example, an under bump seed layer 327 a (see, e.g., FIG. 10) may,for example, be formed at the inside of the opening 311 a (e.g., on sidewalls of the opening 311 a formed in the fourth dielectric layer 326and/or formed in the first dielectric layer 311, and/or on the firstconductive layer 321 or corresponding seed layer 321 a) and outside ofthe opening 311 a (e.g., on the bottom surface of the fourth dielectriclayer 326 surrounding or encircling the opening 311 a). As discussedherein, the under bump seed layer 327 a may be formed using the samematerial(s) and/or process(es) as used to form any of the seed layersdiscussed herein (e.g., with regard to FIGS. 1-6, FIGS. 7-8, etc.), ormay be formed using different respective material(s) and/or process(es).The under bump seed layer 327 a may also be referred to herein as aconductive layer.

As the under bump metal 327 is formed on the opening 311 a of the firstdielectric layer 311 and the conductive interconnection structure 360 isconnected to the under bump metal 327, the conductive interconnectionstructure 360 is electrically connected to the first conductive layer321. In the example provided, the first seed layer 321 a and the underbump seed layer 327 a are directly and electrically connected to eachother, mutually facing each other. In an alternative configuration, thefirst conductive layer 321 may be formed on a first side of the firstseed layer 321 a, and the under bump metal layer 327 may be formed on asecond side of the first seed layer 321 a, for example without adedicated under bump seed layer 327 a being formed.

For discussion purposes herein, the first conductive layer 321, thesecond dielectric layer 322, the second conductive layer 323, and thethird dielectric layer 324 may be considered to be components of aninterposer 320. Furthermore, the above-mentioned micro bump pad 325 andunder bump metal 327 also may be considered to be components of theinterposer 320.

As shown in FIG. 9J, during the separating of the wafer support system1, the wafer support system 1 is separated from the semiconductor die330 and/or the mold material 340. The wafer support system 1 and/or themethod of separating thereof may, for example, share any or allcharacteristics with any wafer support system and/or method ofseparating thereof discussed herein (e.g., with regard to FIGS. 1-6,FIGS. 7-8, etc.).

In the completed example semiconductor device 300, the top surface ofthe semiconductor die 330 may, for example, be exposed to the outsidethrough the top surface of the mold material 340. For example, the topsurface of the semiconductor die 330 and the top surface of the moldmaterial 340 may be coplanar. In another example implementation, themold material 340 may cover the top surface of the semiconductor die330.

As with any or all of the examples discussed herein (e.g., with regardto FIGS. 1-8, etc.), the interposer 320 (or package 300) may, forexample, be formed in a mass configuration or as a single unit. Asdiscussed herein, in an example scenario in which the interposer 320 (orpackage 300) is formed in a mass configuration, a singulation processmay be performed.

Referring to FIG. 10, such figure shows a cross-sectional viewillustrating a semiconductor device 301, in accordance with variousaspects of the present disclosure.

As shown in FIG. 10, the example semiconductor device 301 may comprisean interposer 320, a semiconductor die 330, a mold material 340, anunderfill 350, and a conductive interconnection structure 360. Thesemiconductor device 301 may, for example, share any or all aspects withthe example semiconductor device 300 shown in FIGS. 9A-9J, and/or withany other semiconductor device presented herein (e.g., with respect toFIGS. 1-8, etc.).

The interposer 320 may, for example, comprise a first seed layer 321 aabove a first dielectric layer 311 (for example, a silicon oxide layerand/or a silicon nitride layer), a first conductive layer 321 on thefirst seed layer 321 a, a second dielectric layer 322 covering the firstconductive layer 321, a second seed layer 323 a on the first conductivelayer 321, a second conductive layer 323 on the second seed layer 323 a,and a third dielectric layer 324 covering the second conductive layer323. The line/space/thickness of the first conductive layer 321 may, forexample, be larger than those of the second conductive layer 323.

The interposer 320, or general grouping of layers, may for examplecomprise a micro bump seed layer 325 a extending into and/or through thethird dielectric layer 324 (e.g., via an opening formed therein) and onthe second conductive layer 323, a micro bump pad 325 on the micro bumpseed layer 325 a, an under bump seed layer 327 a below the firstconductive layer 321, and an under bump metal 327 below the under bumpseed layer 327 a. In an example implementation, the first seed layer 321a and the under bump seed layer 327 a are directly and electricallyconnected to each other.

The conductive bump 331 is on the semiconductor die 330, and theconductive bump 331 is electrically connected to the micro bump pad 325through the solder 332. The underfill 350 is between the semiconductordie 330 and the interposer 320 (e.g., the third dielectric layer 324),and the mold material 340 surrounds side parts of the semiconductor die330 and the underfill 350. In the illustrated example, the mold material340 surrounds the side surfaces of the semiconductor die 330 and alsothe top surface thereof.

The conductive interconnection structure 360 may, for example, beconnected to the under bump metal 327 and may also be mounted on asubstrate, as discussed herein.

Labels (1) and (2) shown in FIG. 10 may, for example, show a laminationand/or formation order. For example, in relation to the semiconductordevice 301, in accordance with various aspects of the presentdisclosure, the interposer 320 (or a first portion thereof) is formed inthe direction (1) (e.g., building from the first dielectric layer 311),the semiconductor die 330 is connected to the interposer 320, and thenunder bump seed layer 327 a and under bump metal 327 (which may, forexample, be considered a second portion of the interposer 320) and theconductive interconnection structure 360 is connected to the interposer320 in the direction (2) (e.g., building from the first conductive layer321 or first seed layer 321 a).

Referring to FIG. 11A, such figure shows a cross-sectional view of astructure in an example scenario in which the planarization process ofan interposer is not performed, and referring to FIG. 11B, such figuresshows a cross-sectional view for a structure in an example scenario inwhich a planarization process of an interposer is performed, inaccordance with various aspects of the present disclosure.

As shown in FIG. 11A, since the line/space/thickness of the firstconductive layer 321′ are larger than those of the second conductivelayer 323′ formed thereon, if a planarization process is not performed,the flatness of the second conductive layer 323′ may be diminished.Furthermore, when another third conductive layer (not shown) is formedon the second conductive layer 323′, the flatness of the thirdconductive layer may be diminished further. Example seed layers 321 a′and 323 a′ are also shown.

As shown in FIG. 11B, after the first conductive layer 321 is formed, aplanarization process may be performed, and thus the flatness of thesecond conductive layer 323 may be improved. Additionally, the flatnessof another third conductive layer (not shown) formed on the secondconductive layer 323 may also be improved. Example seed layers 321 a and323 a are also shown.

Referring to FIG. 12A, such figure shows a cross-sectional viewillustrating a first example planarization process, and referring toFIG. 12B, such figure shows a cross-sectional view illustrating a secondexample planarization process (e.g., of conductive and/or dielectriclayers, etc.).

In the first example planarization process shown in FIG. 12A, only theconductive layer 321 is planarized. For example, after the conductivelayer 321 is formed in the illustrated recess of the dielectric layer322 and outside of the recess, as a chemical and/or mechanicalplanarization process is applied to the conductive layer 321 outside ofthe recess. For example, the top surfaces of the conductive layer 321and/or the dielectric layer 322 may be planarized through a damascenemethod.

In the second example planarization process shown in FIG. 12B, only thedielectric layer 322 is planarized. For example, after the conductivelayer 321 is formed and covered with the dielectric layer 322, achemical and/or mechanical planarization process is applied to thedielectric layer 322. For example, the top surfaces of the conductivelayer 321 and/or the dielectric layer 322 may be planarized. Note thatin either of the example planarization processes shown in FIGS. 12A and12B, both the conductive layer 321 and the dielectric layer 322 may beplanarized (e.g., each subjected to chemical and/or mechanicalplanarization).

The planarization may, for example, assist efforts to minimizeline/space/thickness of the one or more conductive layers. Note that theplanarization process may be included in any of the process flowsdiscussed herein (e.g., after formation of a conductive layer and/ordielectric layer).

Referring to FIGS. 13A to 13J, such figures show cross-sectional viewsillustrating a method of manufacturing a semiconductor device 400, inaccordance with various aspects of the present disclosure. The examplesemiconductor devices and/or methods illustrated in FIGS. 13A to 13Jmay, for example, share any or all characteristics with any or all ofthe other example semiconductor devices and/or methods presented herein(e.g., with regard to FIGS. 1A to 1J, for example substituting a glass,ceramic, metal, or other type of for the illustrated silicon carriermaterial, or any other figure).

The example manufacturing method may, for example, comprise providing acarrier 410 with a first dielectric layer 411, forming a firstconductive layer 421, forming a second conductive layer 423 and an underbump metal 425, attaching a first wafer support system 1, removing thecarrier 410, forming an opening 411 a in the first dielectric layer 411,forming a micro bump pad 426 at the opening 411 a, attaching asemiconductor die 430 and molding with a mold material 440 (e.g., aresin, encapsulant, molding compound, etc.), separating the first wafersupport system 1 and attaching a second wafer support system 2 andattaching a conductive interconnection structure 460, and separating thesecond wafer support system 2.

As shown in FIG. 13A, during the providing (or forming) of the carrier410 with the first dielectric layer 411, the carrier 410 such as, forexample, a glass, porous ceramic, or metal with a planar top surface anda planar bottom surface is provided. The carrier 410 may, for example,comprise a semiconductor material (e.g., silicon, GaAs, etc.), glass,ceramic (e.g., porous ceramic, etc.), metal, etc. The carrier 410 mayalso comprise any of a variety of different types of configurations. Forexample, the carrier 410 may be in a mass form (e.g., a wafer form, arectangular panel form, etc.). Also for example, the carrier 410 may bein a singular form (e.g., singulated from a wafer or panel, originallyformed in a singular form, etc.). The carrier 410 may, for example,share any or all characteristics with any carrier discussed herein.

A first dielectric layer 411, for example an organic dielectric layer(e.g., formed of polyimide, Benzo Cyclo Butene or Poly Benz Oxazole,etc.) may be (or may have been) formed on the surface of the carrier410, for example through a coating process. For example, the firstdielectric layer 411 may be formed through any one or more of spincoating, spray coating, dip coating, rod coating, equivalents thereof,etc., but the present disclosure is not limited thereto. Note that thescope of this disclosure is not limited to organic materials. The firstdielectric layer 111 may, for example, be from 0.01 to 0.8 micronsthick. The first dielectric layer 411 may, for example, share any or allcharacteristics with any dielectric layer discussed herein. For example,in various alternative example implementations, the dielectric layer 411may comprise an inorganic material.

A conductive layer with a fine line/space/thickness may be formed on theorganic first dielectric layer 411. For example, a conductive layer witha line/space/thickness of about 2/2/2 μm to about 10/10/10 μm may beformed.

As shown in FIG. 13B, during the forming of the first conductive layer421, which may also be referred to as a redistribution layer, the firstconductive layer 421 may be formed on the first dielectric layer 411. Inone example implementation, a first seed layer 421 a (see, e.g., FIG.14) is formed on the first dielectric layer 411, and the firstconductive layer 421 is formed on the first seed layer 421 a. The firstconductive layer 421 may then be covered with a second dielectric layer422, which may also be referred to herein as a passivation layer.

The first seed layer 421 a and/or the forming thereof, may share any orall characteristics with any of the seed layers and/or the formingthereof discussed herein (e.g., the first seed layer 121 of FIG. 1,etc.). The first conductive layer 421 and/or the forming thereof, mayshare any or all characteristics with any of the conductive layersand/or the forming thereof discussed herein (e.g., the first conductivelayer 121 of FIG. 1, etc.). For example, the first conductive layer 421may be formed to have a finer line/space/thickness in comparison to thesecond conductive layer 423, discussed below.

The second dielectric layer 422 and/or the forming thereof, may shareany or all characteristics with any of the dielectric layers and/or theforming thereof discussed herein (e.g., the second dielectric layer 122of FIG. 1, etc.). An opening 422 a (or aperture) may, for example, beformed in the second dielectric layer 422, and a specific area of thefirst conductive layer 421 may be exposed to the outside through theopening 422 a. The opening 422 a and/or the forming thereof may shareany or all characteristics with any other opening and/or forming thereofdiscussed herein (e.g., the opening 122 a of FIG. 1, etc.).

As shown in FIG. 13C, during the forming of the second conductive layer423 and the under bump metal 425, the second conductive layer 423 andunder bump metal 425 of at least one layer are formed on the firstconductive layer 421 and/or on the second dielectric layer 422.

In one example implementation, a second seed layer 423 a (see, e.g.,FIG. 14) is formed at the inside of the opening 422 a (e.g., on sidewalls of the opening 422 a formed in the second dielectric layer 422and/or on the first conductive layer 421 exposed by the opening 422 a)and/or outside of the opening 422 a (e.g., on the top surface of thesecond dielectric layer 422). As discussed herein, the second seed layer423 a may be formed using the same material(s) and/or process(es) asused to form the first seed layer 421 a, or may be formed usingdifferent respective material(s) and/or process(es). The second seedlayer 423 a and/or the forming thereof may share any or allcharacteristics with any other seed layer and/or the forming thereofdiscussed herein (e.g., the second seed layer 123 a of FIG. 1, etc.).The second seed layer 423 a (or any seed layer discussed herein) mayalso be referred to herein as a conductive layer.

Continuing the example implementation, the second conductive layer 423is formed on the second seed layer 423 a. For example, the secondconductive layer 423 may be formed to fill (or at least cover sidesurfaces of) the opening 422 a in the second dielectric layer 422. Thesecond conductive layer 423 may, for example, be formed using the samematerial(s) and/or processes as the first conductive layer 421, or maybe formed using different respective material(s) and/or process(es). Thesecond conductive layer 423 and/or the forming thereof may share any orall characteristics with any other conductive layer and/or the formingthereof discussed herein (e.g., the second conductive layer 123 of FIG.1, etc.). The second conductive layer 423 may also be referred to hereinas a redistribution layer.

The second conductive layer 423 may then, for example, be covered withthe third dielectric layer 424. The third dielectric layer 424 may, forexample, be formed utilizing the same material(s) and/or process(es) asutilized to form the second dielectric layer 422, or may be formedutilizing different respective material(s) and/or process(es). The thirddielectric layer 424 and/or the forming thereof may share any or allcharacteristics with any other dielectric layer and/or the formingthereof discussed herein (e.g., the third dielectric layer 124 of FIG.1, etc.).

An opening 424 a (or aperture) may, for example, be formed in the thirddielectric layer 424, and a specific area of the second conductive layer423 may be exposed to the outside through the opening 424 a. The opening424 a may be formed in any of a variety of manners (e.g., mechanicaland/or laser ablation, chemical etching, etc.). Alternatively, forexample, the third dielectric layer 124 may be originally formed withthe opening 124 a therein. The opening 424 a and/or the forming thereofmay share any or all characteristics with any opening and/or the formingthereof discussed herein (e.g., the opening 124 a of FIG. 1, etc.).

An under bump seed layer 425 a (see, e.g., FIG. 14) may, for example, beformed at the inside of the opening 424 a (e.g., on side walls of theopening 424 a formed in the third dielectric layer 424 and/or on thesecond conductive layer 423 exposed by the opening 424 a) and/or outsideof the opening 424 a (e.g., on the top surface of the third dielectriclayer 424, for example around and/or encircling the opening 424 a). Asdiscussed herein, the under bump seed layer 425 a may be formed usingthe same material(s) and/or process(es) as used to form the first seedlayer 421 a and/or the second seed layer 423 a, or may be formed usingdifferent respective material(s) and/or process(es). The under bump seedlayer 425 a and/or the forming thereof may share any or allcharacteristics with other under bump seed layers and/or the formingthereof discussed herein (e.g., the under bump seed layer 125 a of FIG.1, etc.). The under bump seed layer 425 a (or any seed layer discussedherein) may also be referred to herein as a conductive layer.

An under bump metal 425 is formed on the under bump seed layer 425 a.The under bump metal 425 may be formed of any of a variety of materials,non-limiting examples of which are presented herein. For example, theunder bump metal 425 may be formed of at least one of chrome, nickel,palladium, gold, silver, alloys thereof, combination thereof,equivalents thereof, etc. The under bump metal 125 may, for example,comprise Ni and Au. Then under bump metal 125 may also, for example,comprise Cu, Ni, and Au. The under bump metal 425 may be also formedutilizing any of a variety of processes, non-limiting example of whichare presented herein. For example, the under bump metal 425 may beformed utilizing one or more of an electroless plating process,electroplating process, sputtering process, etc. The under bump metal425 may, for example, prevent or inhibit the formation of anintermetallic compound at the interface between the conductiveinterconnection structure 460 and the second conductive layer 423,thereby improving the reliability of the connection to the conductiveinterconnection structure 460. The under bump metal 425 and/or theforming thereof may share any or all characteristics with other underbump metals and/or the forming thereof discussed herein (e.g., the underbump metal 125 of FIG. 1, etc.). The under bump metal 425 may also bereferred to herein as a conductive layer. Note that the under bump metal125 may comprise multiple layers. For example, the under bump metal 125may comprise a first layer of Ni and a second layer of Au.

Though not illustrated in FIGS. 13A-13J, following formation of theunder bump metal 425, an edged trim (or profile) process may beperformed, for example in which an edge of the wafer (or plate) beingprocessed is trimmed (or profiled). Such trimming may be performed in avariety of manners, for example by grinding. Such edge trimming may, forexample, protect the wafer from chipping and flaking during subsequentprocessing.

For discussion purposes herein, the first conductive layer 421, thesecond dielectric layer 422, the second conductive layer 423, and thethird dielectric layer 424 may be considered to be component of aninterposer 420. Furthermore, the under bump metal 425 and the micro bumppad 426 described herein may also be considered to be a component of theinterposer 420. Note that term “interposer” is used herein to refer to ageneral package structure (e.g., a dielectric and conductor layeredstructure) that is interposed between other structures, and the scope ofthis disclosure should not be limited or defined by arbitrary notionsregarding interposer composition.

As shown in FIG. 13D, during the attaching of the first wafer supportsystem 1 (WSS), the first wafer support system 1 is attached to thethird dielectric layer 424. For example, the first wafer support system1 may be attached to the third dielectric layer 424 and the under bumpmetal 425 and at this point, and the carrier 410 that is shown at thebottom of FIG. 13C is repositioned to the top of FIG. 14D (e.g., thediagram is inverted). The first WSS 1 may be attached to the thirddielectric layer 424 and/or to the under bump metal 425 in any of avariety of manners, non-limiting examples of which are provided herein.For example, the first WSS 1 (or any WSS discussed herein) may beattached to the third dielectric layer 424 and/or to the under bumpmetal 425 utilizing a temporary adhesive that loses its adhesion whenexposed to thermal energy or light energy, when exposed to particularchemicals, etc. One or more additional release layers may also beutilized to ease subsequent release of the first wafer support system 1.The attachment process may, for example, comprise baking the assembly(e.g., at 250° for 30 mins, etc.). The first wafer support system 1 maybe formed from any of a variety of materials. For example, the first WSS1 (or any WSS discussed herein) may be formed from one or more of asilicon wafer, a glass wafer, a ceramic wafer, a metal wafer, etc.Though the first WSS 1 is generally presented herein in the form of awafer, the scope of this disclosure is not limited to such shape. TheWSS 1 of FIG. 13D and/or the attachment or detachment thereof may shareany or all characteristics with any WSS and/or the attachment ordetachment thereof discussed herein (e.g., the WSS 1 of FIG. 1D, etc.).

As shown in FIG. 13E, during the removing of the carrier 410, thecarrier 410 (for example, a glass wafer on which the first dielectriclayer 411 was formed) on a side of the structure opposite the firstwafer support system 1 is removed. The first WSS 1 may be removed in anyof a variety of manners, non-limiting examples of which are presentedherein (e.g., with regard to any wafer support system discussed herein).

In an example implementation, as laser beam, thermal beam, or infraredbeam is provided to the carrier 410, the carrier 410 may be separatedfrom the first dielectric layer 411. For example, as light or thermalenergy is provided to the interface of the carrier 410 and the firstdielectric layer 411, an adhesion between the carrier 410 and the firstdielectric layer 411 is reduced and accordingly, the carrier 410 isseparated from the first dielectric layer 411.

In another example implementation, most of the carrier 410 may beremoved through a mechanical grinding process and then, the remainingcarrier 410 may be removed through a chemical etching process. In such amanner, as a result, only the first dielectric layer 411 (for example, apolyimide layer) formed on the surface of the carrier 410 remains. Forexample, as illustrated in FIG. 13E, only the first dielectric layer 411of a predetermined thickness remains on the first conductive layer 421and the second dielectric layer 422. Note that the carrier removalprocess may also remove a portion of the first dielectric layer 411; forexample, the first dielectric layer 411 may be thinner after removal ofthe carrier 410 than when originally formed on the carrier 410. In anexample implementation, as mentioned above, the first dielectric layer411 may be formed of an organic material, and the second and thirddielectric layers 422 and 424 may also be formed of an organic material.Note, however, that the scope of the present disclosure is not limitedto such example types of materials.

As shown in FIG. 13F, during the forming of the openings 411 a (orapertures) in the first dielectric layer 411, a plurality of openings411 a are selectively formed in the first dielectric layer 411. Theopenings 411 a may be formed in any of a variety of manners (e.g.,mechanical and/or laser ablation, chemical etching, photo etchingprocess, photo-masking and etching process, etc.). Each of the openings411 a may, for example, correspond to a respective specific area of thefirst conductive layer 421, exposed to the outside by the opening 411 a.In an example implementation, an opening 411 a exposes a respectivespecific area of the first conductive layer 421 to the outside throughthe organic first dielectric layer 411. In an example implementation inwhich the first conductive layer 421 was formed on a first seed layer421 a, a specific area of the first seed layer 421 a on which the firstconductive layer 421 was formed is exposed to the outside through theorganic first dielectric layer 411. The openings 411 a and/or theforming thereof may share any or all characteristics with any otheropening and/or the forming thereof discussed herein (e.g., the opening111 a of FIG. 1, etc.). Note that in an example scenario in which adielectric layer (or passivation layer) mask is utilized during aprocess of etching the openings 411 a, the dielectric layer may bestripped after such etching, but may also remain (e.g., as a passivationlayer, etc.).

As shown in FIG. 13G, during the forming of the micro bump pad 426 (orother pad, landing, attachment structure, etc.) in the opening 411 a,the micro bump pad 426 is formed in the opening 411 a so that the microbump pad 426 is electrically connected to the first conductive layer 421(e.g., directly connected, connected via a seed layer, etc.). In anexample implementation, the micro bump seed layer 426 a (e.g., as shownin FIG. 14) is formed at the inside of the opening 411 a (e.g., on sidewalls of the opening 411 a formed in the first dielectric layer 411and/or on the first conductive layer 421) and/or outside of the opening411 a (e.g., on the top surface (in FIG. 13G) of the first dielectriclayer 411 surrounding the opening 411 a). The micro bump seed layer 426a may, for example, be formed utilizing the same material(s) and/orprocess(es) discussed herein with regard to other seed layers orconductive layers, or may be formed utilizing different respectivematerial(s) and/or process(es). The micro bump seed layer 426 a and/orthe forming thereof may, for example, share any or all characteristicswith any other micro bump seed layer and/or the forming thereofdiscussed herein (e.g., the micro bump seed layer 126 a of FIG. 1,etc.).

The micro bump pad 426 may then, for example, be formed on the microbump seed layer 426 a. In an example implementation, the first seedlayer 421 a (e.g., on which the first conductive layer 421 was formed)and the micro bump seed layer 426 a (e.g., on which the micro bump pad426 is formed) may be interposed between the first conductive layer 421and the micro bump pad 426. For example, the first seed layer 421 a andthe micro bump seed layer 426 a may be directly connected to each other,mutually facing each other. Note that in various exampleimplementations, the micro bump seed layer 426 a might be skipped, andthe micro bump pad 426 formed on the first seed layer 421 a exposedthrough the opening 411 a (e.g., in an example implementation in whichthe first seed layer 421 a is adequately formed to be utilized in suchmanner). The micro bump seed layer 426 a and/or micro bump pad 426 mayalso be referred to herein as a conductive layer.

The micro bump pad 426 may comprise any of a variety of materials,non-limiting examples of which are provided herein. For example, themicro bump pad 426 may comprise copper, aluminum, gold, silver,palladium, general conductive material, conductive material, equivalentsthereof, combinations thereof, alloys thereof, any conductive materialdiscussed herein, etc. In an example implementation, the micro bump pad126 may comprise Ni and Au. In another example implementation, the microbump pad 126 may comprise Ni, Au, and Cu. The micro bump pad 426 may beformed utilizing any of a variety of processes, non-limiting examples ofwhich are provided herein. For example, the micro bump pad 426 may beformed utilizing one or more of an electroless plating process, anelectrolytic plating process, a sputtering process, etc.

The micro bump pad 426 is shown in FIG. 13G as extending past (orprotruding from) the top surface of the first dielectric layer 411, butthe scope of this disclosure is not limited thereto. For example, themicro bump pad 426 may comprise a top surface that is coplanar with thetop surface of the first dielectric layer 411, or may comprise a topsurface that is below the top surface of the first dielectric layer 411.Though generally shown comprising a cylindrical shape, the micro bumppad 426 of FIG. 13G may comprise any of a variety of geometricconfigurations, various non-limiting examples of which are providedherein. The micro bump pad 426 and/or the forming thereof may, forexample, share any or all characteristics with any other micro bump padand/or the forming thereof discussed herein (e.g., the micro bump pad126 of FIG. 1, etc.).

Also note that the micro bump pad 426 may alternatively be formed in anaperture in the first dielectric layer 411 near the beginning of theoverall process shown in FIGS. 13A-13J. For example, between FIGS. 13Aand 13B, an aperture may be formed in the first dielectric layer 411 (ifsuch layer exists) and the micro bump pad 426 may be formed on thecarrier 410 in such aperture before formation of the first conductivelayer 421 thereon.

As shown in FIG. 13H, during the attaching of the semiconductor die 430and the molding with the mold material 440, the semiconductor die 430 iselectrically connected to the micro bump pad 426 and is molded with themold material 440. For example, the conductive bump 431 (or otherconductive attachment structure, for example conductive pillar, etc.) ofthe semiconductor die 430 is electrically connected to the micro bumppad 426 through the solder 432. The conductive bump 431 of thesemiconductor die 430 may be attached to the micro bump pad 426 in anyof a variety of manners, non-limiting examples of which are presentedherein. For example, the conductive bump 431 may be soldered to themicro bump pad 426 utilizing any of a variety of solder attachmentprocesses (e.g., a mass reflow process, a thermal compression process, alaser soldering process, etc.). Also for example, the conductive bump431 may be coupled to the micro bump pad 426 utilizing a conductiveadhesive, paste, etc. In an example scenario, a solder paste may beapplied to the micro bump pad 126 utilizing a stencil and squeegee, theconductive bump 131 of the semiconductor die 130 may be positioned on orin the solder paste (e.g., utilizing a pick-and-place process), and thesolder paste may then be reflowed. After attachment of the semiconductordie 130, the assembly may be cleaned (e.g., with hot DI water, etc.),subjected to a flux clean and bake process, subjected to a plasmatreatment process, etc.

In an example implementation, an underfill 450 may be formed between thesemiconductor die 430 and the first dielectric layer 411, for examplesurrounding portions of the bumps 431 and micro bump pads 426 that areexposed to (and thus encapsulated by) the underfill 450. The underfill450 may comprise any of a variety of underfill materials. Also theunderfill 450 may be formed utilizing any of a variety of processes(e.g., a capillary underfilling process, utilizing a pre-appliedunderfill material, etc.). The under fill 450 between the semiconductordie 430 and the interposer 420 (as various layers are illustrativelygrouped in FIG. 13H) may, for example, prevent or reduce warpage, forexample due to a thermal expansion coefficient difference between thesemiconductor die 430 and the interposer 420.

In the molding (or encapsulating) process, the semiconductor die 130and/or interposer 120 may be encapsulated with a mold material 140(e.g., a molding resin or other mold material or encapsulant), which maythen be cured. In an example implementation, the mold material 440covers the side surfaces and top surface of the semiconductor die 430.In another example implementation, the mold material 440 only covers theside surfaces of the semiconductor die 430 (or only respective portionsthereof), thus leaving the top surface of the semiconductor die 430exposed from the mold material 140. The mold material 440 may be formedin any of a variety of manners (e.g., compression molding, transfermolding, flood molding, etc.). The mold material 440 may comprise any ofa variety of types of mold material. For example, the mold material 440may comprise a resin, an epoxy, a thermosetting epoxy molding compound,a room temperature curing type, etc.

When the size of a filler (e.g., an organic filler or other particlecomponent) of the mold material 440 is smaller (or substantiallysmaller) than the size of a space or a gap between the interposer 420and the semiconductor die 430, the underfill 450 might not be utilized,and the mold material 440 may instead fill a space or gap between theinterposer 420 and the semiconductor die 430. In such an examplescenario, the underfilling process and the molding process may becombined into a single molding process with a molded underfill. The moldmaterial 440 and/or the forming thereof may, for example, share any orall characteristics with any mold material and/or the forming thereofdiscussed herein (e.g., the mold material 140 of FIG. 1, etc.).

The semiconductor die 430, for example, may comprise any of a variety oftypes of semiconductor die, non-limiting examples of which are providedherein. For example, the semiconductor die 130 may comprise a digitalsignal processor (DSP), a microcontroller, a microprocessor, a networkprocessor, a power management processor, an audio processor, a videoprocessor, an RF circuit, a wireless baseband system-on-chip (SoC)processor, a sensor, an application specific integrated circuit, etc.

As shown in FIG. 131, during the attaching of the second wafer supportsystem 2, the separating of the first wafer support system 1, and theattaching of the conductive interconnection structure 460, the secondWSS 2 may be attached to the semiconductor die 430 and/or mold material440. For example, the second WSS 2 may share any or all characteristicswith the first WSS 1. The second WSS 2 may, for example, be attached ina same manner as the first WSS 1 (e.g., utilizing a temporary adhesive,vacuum, mechanical attachment mechanism, etc.).

After attachment of the second WSS 2, the first wafer support system 1attached to the third dielectric layer 424 is separated from the thirddielectric layer 424 and/or under bump metal 425. As discussed herein,the first WSS 1 may have been attached to the third dielectric layer 424and/or to the under bump metal 425 utilizing a temporary adhesive thatloses it adhesion (or a substantial portion thereof) when exposed tothermal energy, laser energy, chemical agents, etc. The separation ofthe first WSS 1 from the third dielectric layer 424 and/or under bumpmetal 425 may, for example, be performed by exposing the temporaryadhesive to the energy and/or chemicals that cause the adhesive toloosen. In an example scenario in which a release layer was utilized toattach a glass first WSS 1, the release layer (e.g., between theadhesive and the first WSS 1) may be subjected to laser irradiationthrough the glass first WSS 1, to effect or assist with the release ofthe first WSS 1 from the adhesive. Note that other forms of WSSattachment/detachment may be utilized (e.g., vacuum attachment,mechanical attachment, etc.). Adhesive utilized to attach the first WSS1 may, for example, be removed with a solvent if necessary.

The conductive interconnection structure 460 (or a plurality thereof)may be electrically connected to the exposed under bump metal 425. Atthis point, for example while the second wafer support system 2 isattached to the semiconductor die 430 and the mold material 440, theconductive interconnection structure 460 may be electrically connectedto the under bump metal 425.

The conductive interconnection structure 460 may comprise any of avariety of characteristics, non-limiting examples of which are presentedherein. For example, the conductive interconnection structure 460 may beformed of one of a eutectic solder (Sn37Pb), a high lead solder(Sn95Pb), a lead-free solder (SnAg, SnAu, SnCu, SnZn, SnZnBi, SnAgCu,and SnAgBi), combination thereof, equivalents thereof, etc. Theconductive interconnection structure 460 (and/or any conductiveinterconnection structure discussed herein) may, for example, comprise aconductive ball (e.g., a solder ball, a copper-core solder ball, etc.),a conductive bump, a conductive pillar or post (e.g., a copper pillar, asolder-capped copper pillar, a wire, etc.), etc.

The conductive interconnection structure 460 may, for example, beconnected to the under bump metal 425 utilizing any of a variety ofreflow and/or plating processes. For example, volatile flux may bedeposited (e.g., dotted, printed, etc.) on the under bump metal 425, theconductive interconnection structure 460 may be deposited (e.g.,dropped, etc.) on the volatile flux, and then a reflow temperature ofabout 150° C. to about 250° C. may be provided. At this point, thevolatile flux may, for example, be volatized and completely removed.

The conductive interconnection structure 460, as mentioned above, may bereferred to as a conductive bump, a conductive ball, a conductivepillar, a conductive pose, a conductive wire, etc., and may, forexample, be mounted on a rigid printed circuit board, a flexible printedcircuit board, a lead frame, etc. For example, the semiconductor die 430including the interposer 420 may then be electrically connected (e.g.,in a flip-chip form or similar to a flip-chip form) to any of a varietyof substrates (e.g., motherboard substrates, packaging substrates, leadframe substrates, etc.).

As shown in FIG. 13J, during the separating of the second wafer supportsystem 2, the second wafer support system 2 attached to thesemiconductor die 430 and/or the mold material 440 is separated from thesemiconductor die 430 and/or mode material 440. For example, in thecompleted semiconductor device 400, the top surface of the semiconductordie 430 may be exposed to the outside through the top surface of themold material 440. For example, the top surface of the semiconductor die430 and the top surface of the mold material 440 may be coplanar. Inanother example implementation, the mold material 440 may cover the topsurface of the semiconductor die 430.

The interposer 420 (or package or device 400) may, for example, beformed in a mass configuration (e.g., in a wafer, panel, strip, matrix,etc.) or as a single unit. In a scenario in which the interposer 120 (orpackage or device 400) is formed in a mass configuration, after theseparating of the second wafer support system 2 (or before suchseparation), the interposer 420 and the mold material 440 may besingulated or cut (e.g., are by a diamond blade or laser beam,snap-separated, pull-separated, etc.). In such a scenario, the sidesurfaces of the interposer 420 and the mold material 440 may be madecoplanar by such a singulation process. In an example scenario, aplurality of the packages or devices 400 may be placed (e.g., mold sidedown) on a saw tape, and then sawed. The saw may, for example, cutthrough the packages or devices 400 and partially through the saw tape.After sawing, the packages or devices 400 may be baked. Aftersingulation, the individual packages or devices 400 may be individuallyinserted into trays (e.g., utilizing a pick and place process)

In accordance with the example illustrated provided in FIG. 1 anddiscussed herein, the present disclosure provides a semiconductor device400 (and manufacturing method thereof) comprising the interposer 420,for example without a through silicon via. Such a semiconductor device400 may, for example, be manufactured utilizing general bumpingequipment, for example without utilizing complex and expensive throughsilicon via production processes. For example, according to variousaspects of the present disclosure, as a conductive layer with arelatively fine line/space/thickness may be formed first on the carrier410 (for example, a glass wafer), and then such carrier 410 may beremoved.

Referring to FIG. 14, such figure shows a cross-sectional view of asemiconductor device 401, in accordance with various aspects of thepresent disclosure. For illustrative clarity, only one conductiveinterconnection structure 160 is shown.

As shown in FIG. 14, the example semiconductor device 401 may comprisean interposer 420, a semiconductor die 430, a mold material 440, anunderfill 450, and a conductive interconnection structure 460. Thesemiconductor device 401 may, for example, share any or all aspects withany or all other semiconductor devices presented herein (e.g., theexample semiconductor device 400 shown in FIGS. 13A-13J, any of thesemiconductor devices shown in FIGS. 1-6, FIGS. 7-8, and FIGS. 9-12,etc.).

The interposer 420, or general grouping of layers, may for examplecomprise a first seed layer 421 a below a first dielectric layer 411(for example, a polyimide layer), a first conductive layer 421 below thefirst seed layer 421 a, a second dielectric layer 422 covering the firstconductive layer 421 (or portions thereof), a second seed layer 423 abelow the first conductive layer 421, a second conductive layer 423below the second seed layer 423 a, and a third dielectric layer 424covering the second conductive layer 423 (or portions thereof). Theline/space/thickness of the first conductive layer 421 may, for example,be smaller than that of the second conductive layer 423.

The interposer 420 may, for example, comprise a micro bump seed layer426 a extending into and/or through the first dielectric layer 411(e.g., through an opening formed therein) and on the first seed layer421 a, a micro bump pad 426 on the micro bump seed layer 426 a, an underbump seed layer 125 a below the second conductive layer 423, and anunder bump metal 425 below the under bump seed layer 425 a. In anexample implementation, the first seed layer 421 a and the micro bumpseed layer 426 a are directly and electrically connected to each other.

As discussed herein, the term “interposer” may be utilized herein toconveniently group various layers for discussion. It should beunderstood, however, that an interposer or interposer structure maycomprise any of a variety of the layers discussed herein, and is notlimited to any particular set of layers.

The conductive bump 431 is on the semiconductor die 430 and theconductive bump 431 is electrically connected to the micro bump pad 426through the solder 432. The underfill 450 is between the semiconductordie 430 and the interposer 420 (e.g., the first dielectric layer 411),and the mold material 440 surrounds side surfaces of the semiconductordie 430 and the underfill 450. In the illustrated example, as opposed tothe example device 400 shown in FIG. 13J, the mold material 440surrounds the side surfaces of the semiconductor die 430 and also thetop surface thereof. The conductive interconnection structure 460 may,for example, be connected to the under bump metal 425 and may also bemounted on a substrate as discussed herein.

Labels (1), (2), and (3) shown in FIG. 14 may, for example, show alamination and/or formation order. For example, in relation to thesemiconductor device 401, in accordance with various aspects of thepresent disclosure, the interposer 420 is formed in the direction (1)(e.g., building from the first dielectric layer 411), and then, thesemiconductor die 430 is connected to the interposer 420 in thedirection (2) (e.g., building from the interposer 420), and then, theconductive interconnection structure 460 is attached to the interposer120 in the direction (3) (e.g., building from the interposer 120).

In comparison to the semiconductor device 400 discussed with regard toFIG. 13A-13J, the example semiconductor device 401 comprises a pad 426(e.g., a micro bump pad) that is wider at a top end (e.g., to beconnected with a conductive bump 431 of the semiconductor die 430) thanat a bottom end (e.g., extending through the first dielectric layer411). For example, rather than being cylindrically shaped as shown inthe micro bump pad 426 of FIGS. 13G-13J, the micro bump pad 426 may becup-shaped or mushroom-shaped (e.g., with sloped stem sidewalls oralternatively vertical stem sidewalls). The micro bump pad 426 is alsoillustrated with vertical cap sidewalls.

Referring to FIGS. 15A to 15H, such figures show cross-sectional viewsillustrating a method of manufacturing a semiconductor device 500, inaccordance with various aspects of the present disclosure. The examplesemiconductor devices and/or methods illustrated in FIGS. 15A to 15Hmay, for example, share any or all characteristics with any or all ofthe other example semiconductor devices and/or methods presented herein(e.g., with regard to FIGS. 7A to 7H, for example substituting a glass,ceramic, metal, or other type of carrier for the illustrated siliconcarrier 210, or any other figure).

The example method of manufacturing the semiconductor device 500 may,for example, comprise providing a carrier 510 with a first dielectriclayer 511, forming a first conductive layer 521, attaching asemiconductor die 530 and molding with a mold material 540, attaching awafer support system 1 and removing the carrier 510, forming an opening511 a through the first dielectric layer 511, forming a secondconductive layer 525 and an under bump metal 527, attaching a conductiveinterconnection structure 560, and separating the wafer support system1.

As shown in FIG. 15A, during the providing of the carrier 510 with thefirst dielectric layer 511, the carrier 510, such as, for example, aglass, porous ceramic, metal, etc. (e.g., with a planar top surface anda planar bottom surface) is provided. The carrier 510 and/or theproviding or forming thereof may, for example, share any or allcharacteristics with any carrier and/or the providing or forming thereofdiscussed herein (e.g., the carrier 210 of FIGS. 7A-7H, etc.).

A first dielectric layer 511 (e.g., formed of polyimide, Benzo CycloButene, Poly Benz Oxazole, etc.) may be formed on the surface of thecarrier 511 through a coating process. The first dielectric layer 511and/or the providing or forming thereof may, for example, share any orall characteristics with any dielectric layer and/or the forming thereofdiscussed herein (e.g., the first dielectric layer 411 of FIGS. 13-14,etc.).

As shown in FIG. 15B, during the forming of the first conductive layer521, which may also be referred to as a redistribution layer, the firstconductive layer 521 may be formed on the first dielectric layer 511.The first conductive layer 521 and/or the forming thereof may, forexample, share any or all characteristics with any other conductivelayer and/or the forming thereof discussed herein (e.g., with regard toFIGS. 7-8, etc.). In one example implementation, a first seed layer 521a (see, e.g., FIG. 17) is formed on the first dielectric layer 511, andthe first conductive layer 521 is formed on the first seed layer 521 a.

The first conductive layer 521 may then be covered with a seconddielectric layer 522. The second dielectric layer 522, and/or theforming thereof may, for example, share any or all characteristics withany other dielectric layer and/or the forming thereof discussed herein(e.g., with regard to FIGS. 7-8, etc.).

The forming of the first conductive layer 521 (e.g., with or without aseed layer 521 a) and the second dielectric layer 522 may be repeatedany number of times (e.g., utilizing the same materials and/or processesor different respective materials and/or processes).

Additionally, an opening 522 a (or aperture) may be formed in the seconddielectric layer 522 corresponding to the first conductive layer 521 (ora portion thereof). The opening 522 a and/or the forming thereof mayshare any or all characteristics with other openings and/or the formingthereof discussed herein. For example, the opening 522 a may share anyor all characteristics with the opening 222 a discussed herein (e.g.,with regard to FIGS. 7-8, etc.).

A micro bump pad 523 or other pad, landing, or attachment structure)may, for example formed in the opening 522 a. The micro bump pad 523and/or the forming thereof may, for example, share any or allcharacteristics with other pads discussed herein (e.g., the micro bumppad 226 of FIGS. 7-8, etc.). For example, a micro bump seed layer 523 amay be formed on (e.g., directly on) the first conductive layer 521exposed through the opening 522 a, and the micro bump pad 523 may beformed on the micro bump seed layer 523 a. The micro bump seed layer 523a and/or micro bump pad 523 may also be referred to herein as conductivelayers.

As shown in FIG. 15C, during the attaching of the semiconductor die 530and the molding with the mold material 540, the semiconductor die 530 iselectrically connected to the micro bump pad 523 and is molded with themold material 540. The semiconductor die 530 and/or the attachingthereof may share any or all characteristics with other semiconductordies and/or the attaching thereof discussed herein (e.g., thesemiconductor die 430 and/or the attaching thereof discussed herein withregard to FIGS. 7-8, etc.).

For example, the conductive bump 531 (or other conductive attachmentstructure) of the semiconductor die 530 is electrically connected to themicro bump pad 523 through the solder 542. The conductive bump 531 ofthe semiconductor die 530 may be attached to the micro bump pad 523 (orother pad or landing structure) in any of a variety of manners,non-limiting examples of which are presented herein. For example, theconductive bump 531 may be soldered to the micro bump pad 523 utilizingany of a variety of solder attachment processes (e.g., a mass reflowprocess, a thermal compression process, etc.). Also for example, theconductive bump 531 may be coupled to the micro bump pad 523 utilizing aconductive adhesive, paste, etc.

In an example implementation, an underfill 550 may be formed between thesemiconductor die 530 and the interposer 520 (e.g., the seconddielectric layer 522), for example, surrounding portions of theconductive bumps 531 and micro bump pads 523 that are exposed to theunderfill 550. The underfill 550 and/or the formation thereof, may shareany or all characteristics with other underfills and/or the formationthereof discussed herein (e.g., the underfill 450 discussed herein withregard to FIGS. 7-8, etc.). The underfill 550 may comprise any of avariety of underfill materials. Also the underfill 550 may be formedutilizing any of a variety of processes (e.g., a capillary underfillingprocess, utilizing a pre-applied underfill material, etc.). The underfill 550 between the semiconductor die 230 and the interposer 520 (asvarious layers are illustratively grouped in FIG. 17) may, for exampleprevent or reduce warpage, for example due to thermal expansioncoefficient difference between the semiconductor die 530 and theinterposer 520.

In the molding process, the semiconductor die 530 and/or interposer 520may be encapsulated with a mold material 540 (e.g., a molding resin orother mold material). The mold material 540 and/or the forming thereofmay, for example, share any or all characteristics with other moldmaterials and/or the forming thereof discussed herein (e.g., the moldmaterial 440 discussed herein with regard to FIGS. 7-8, etc.). In anexample implementation, the mold material 540 covers the side surfacesand top surface of the semiconductor die 530. In another exampleimplementation, the mold material 540 only covers the side surfaces ofthe semiconductor die 530 (or only respective portions thereof), thusleaving the top surface of the semiconductor die 530 exposed from themold material 540. The mold material 540 may be formed in any of avariety of manners (e.g., compression molding, transfer molding, floodmolding, etc.). The mold material 540 may comprise any of a variety oftypes of mold material. For example, the mold material 540 may comprisea resin, an epoxy, a thermosetting epoxy molding compound, a roomtemperature curing type, etc. As discussed herein, the mold material 540may also be utilized to form a molded underfill, for example instead ofthe underfill 550.

As shown in FIG. 15D, during the attaching of the wafer support system 1and the removing of the carrier 510, the wafer support system 1 isattached to the top surfaces of the semiconductor die 530 and the moldmaterial 540, and then the carrier 510 (for example, a glass wafer orpanel) below the first dielectric layer 511 is removed. The wafersupport system 1 and/or the attachment thereof may, for example, shareany or all characteristics with other wafer support systems discussedherein (e.g., the example first wafer support system 1 of FIGS. 7-8,etc.).

The carrier 510 may be removed in any of a variety of manners,non-limiting examples of which are provided herein. For example, thecarrier 510 may be removed in any manner discussed herein with regard toany of the other carriers discussed herein (e.g., with regard to thecarrier 410 of FIG. 13, etc.). In an example implementation, as a laserbeam, thermal beam, or infrared beam is provided to the carrier 510, thecarrier 510 may be separated from the first dielectric layer 511. Forexample, in an example implementation, light or thermal energy may beprovided to the interface of the carrier 510 and the first dielectriclayer 511 to reduce or eliminate adhesion between the carrier 510 andthe first dielectric layer 511, at which point the carrier 510 may beseparated from the first dielectric layer 511. In another exampleimplementation, most (or all) of the carrier 510 may be removed througha mechanical grinding process and then, the remaining carrier 510 (ifany) may be removed through a chemical etching process.

In an example scenario in which the entirety of the carrier 510 isremoved, only the first dielectric layer 511 (for example, a polyimidelayer) originally formed or provided on the surface of the carrier 510remains. For example, only the first dielectric layer 511 might remainon the bottom surfaces of the first conductive layer 521 and the seconddielectric layer 522.

As shown in FIG. 15E, during the forming of the openings 511 a (orapertures) in the first dielectric layer 511, a plurality of openings511 a are selectively formed in the first dielectric layer 511. Theopenings 511 a and/or the forming thereof may, for example, share any orall characteristics with other openings and/or the forming thereofdiscussed herein (e.g., with regard to FIGS. 1-6, etc.). For example,the openings 511 a may be formed in any of a variety of manners (e.g.,mechanical and/or laser ablation, chemical etching, photo etchingprocess, etc.). Each of the openings 511 a may, for example, correspondto a respective specific area of the first conductive layer 521 exposedto the outside by the opening 511 a. In an example implementation, anopening 511 a exposes a respective specific area of the first conductivelayer 521 to the outside through the organic first dielectric layer 511.In an example implementation in which the first conductive layer 521 wasformed on a first seed layer 521 a, a specific area of the first seedlayer 521 a on which the first conductive layer 521 was formed isexposed to the outside through the organic first dielectric layer 511.

The example illustration of FIG. 15E also shows a third dielectric layer524 formed on (e.g., directly on) the first dielectric layer 511. Such athird dielectric layer 524 and/or the forming thereof may share any orall characteristics with the other dielectric layers or the formingthereof discussed herein (e.g., with regard to FIGS. 7-8, etc.). In anexample scenario, the third dielectric layer 524 may comprise an organiclayer, and the first dielectric layer 511 may also comprise an organiclayer. In such an example implementation, the openings 511 a may beformed through both the third dielectric layer 524 and the firstdielectric layer 511 in a same forming process.

As shown in FIG. 15F, during the forming of the second conductive layer525 and the under bump metal 527, the second conductive layer 525 andunder bump metal 527 of at least one layer are formed below the firstconductive layer 521 and/or below the third dielectric layer 524.

In one example implementation, a second seed layer 525 a (see, e.g.,FIG. 17) is formed at the inside of the opening 511 a (e.g., on sidewalls of the opening 511 a formed in the first 511 and/or thirddielectric layers 524, and/or on the first conductive layer 521) and/oroutside of the opening 511 a (e.g., on the bottom surface of the thirddielectric layer 524. The second seed layer 525 a may also be referredto herein as a conductive layer. In an example implementation, thesecond seed layer 525 a may be formed directly on the first seed layer521 a. In various example implementations, however, forming the secondseed layer 525 a may be skipped and the second conductive layer 525formed on the first seed layer 521 a.

Continuing the example implementation, the second conductive layer 525is formed on the second seed layer 525 a. For example, the secondconductive layer 525 may be formed to fill (or at least cover sidesurfaces of) the opening 511 a in the third dielectric layer 524 and/orin the first dielectric layer 511. The second conductive layer 525 may,for example, be formed using the same material(s) and/or processes asother conductive layers presented herein (e.g., the second conductivelayer 225 of FIGS. 7-8), or may be formed using different respectivematerial(s) and/or process(es). The second conductive layer 225 may alsobe referred to herein as a redistribution layer.

The second conductive layer 525 may then, for example, be covered with afourth dielectric layer 526. The fourth dielectric layer 526 may, forexample, be formed utilizing the same material(s) and/or process(es) asutilized to form the first 511, second 522, and/or third 524 dielectriclayers, or may be formed utilizing different respective material(s)and/or process(es).

Formation of the third dielectric layer 524 and the second conductivelayer 525 (e.g., with or without a seed layer 525 a) may be repeated anynumber of times (e.g., utilizing the same materials and/or processes ordifferent respective materials and/or processes). The exampleillustrations in FIGS. 15F-15H show two formations of such layers. Assuch, the layers are provided with similar labels in the figures (e.g.,repeating the third dielectric layer 524 and the second conductive layer525).

An opening 524 a (or aperture) may, for example, be formed in the fourthdielectric layer 526, and a specific area of the second conductive layer525 may be exposed to the outside through the opening 524 a. As with allopenings discussed herein, the opening 524 a may be formed in any of avariety of manners (e.g., mechanical and/or laser ablation, chemicaletching, masking during formation of the dielectric layer, etc.).

An under bump seed layer 527 a (see, e.g., FIG. 17) may, for example, beformed at the inside of the opening 524 a (e.g., on side walls of theopening 524 a formed in the fourth dielectric layer 526 and/or on thesecond conductive layer 525 exposed by the opening 524 a) and/or outsideof the opening 524 a (e.g., on the bottom surface of the fourthdielectric layer 526, for example around and/or encircling the opening524 a). As discussed herein, the under bump seed layer 527 a may beformed using the same material(s) and/or process(es) as used to form anyof the seed layers discussed herein (e.g., the under bump seed layer 227a of FIGS. 7-8, etc.), or may be formed using different respectivematerial(s) and/or process(es). The under bump seed layer 527 a may alsobe referred to herein as a conductive layer.

An under bump metal 527 is formed on the under bump seed layer 527 a.The under bump metal 527 and/or the forming thereof may share any or allcharacteristics with other under bump metals and/or the forming thereofdiscussed herein (e.g., the under bump metal 227 of FIGS. 7-8, etc.).

For discussion purposes herein, the first conductive layer 521, thesecond dielectric layer 522, the second conductive layer 525, the thirddielectric layer 524, and the fourth dielectric layer 526 may beconsidered to be components of the interposer 520. Furthermore, themicro bump pad 523 and under bump metal 527 also may be considered to becomponents of the interposer 520.

As shown in FIG. 15G, during the attaching of the conductiveinterconnection structure 560, the conductive interconnection structure560 is electrically connected to the under bump metal 527. At thispoint, while the wafer support system 1 is attached to the semiconductordie 530 and the mold material 540, the conductive interconnectionstructure 560 may be electrically connected to the under bump metal 527.The conductive interconnection structure 560 and/or method of attachingthereof may, for example, share any or all characteristics with anyconductive interconnection structure and/or method of attaching thereofdiscussed herein (e.g., the conductive interconnection structure 260 ofFIGS. 7-8, etc.).

As shown in FIG. 15H, during the separating of the wafer support system1, the wafer support system 1 attached to the semiconductor die 530and/or the mold material 540 is separated from the semiconductor die 530and/or mode material 540. The wafer support system 1 and/or the methodof separating thereof may, for example, share any or all characteristicswith any other wafer support system and/or method of separating thereofdiscussed herein (e.g., the first wafer support system 1 FIGS. 7-8,etc.).

In the completed example semiconductor device 500, the top surface ofthe semiconductor die 530 may, for example, be exposed to the outsidethrough the top surface of the mold material 540. For example, the topsurface of the semiconductor die 530 and the top surface of the moldmaterial 540 may be coplanar. In another example implementation, themold material 540 may cover the top surface of the semiconductor die530.

As with any or all of the examples discussed herein (e.g., with regardto FIGS. 1-6, FIGS. 7-8, etc.), the interposer 520 (or package 500) may,for example, be formed in a mass configuration or as a single unit. Asdiscussed herein, in an example scenario in which the interposer 520 (orpackage 500) is formed in a mass configuration, a singulation processmay be performed.

Referring to FIG. 16, such figure shows a cross-sectional view of amethod of separating a semiconductor die 530 from a carrier 510, inaccordance with various aspects of the present disclosure. The examplecarrier and/or method of removal thereof illustrated in FIG. 16 anddiscussed herein may, for example, share any or all characteristics withany carrier and/or removal method discussed herein.

As shown in FIG. 16, a first dielectric layer 511 (for example, apolyimide layer) may be formed on a carrier 510 (for example, a glasswafer), a first conductive layer 521 and a second dielectric layer 522may be formed on the first dielectric layer 511, a micro bump pad 523may be formed on the first conductive layer 521, a conductive bump 531of a semiconductor die 530 may be connected to the micro bump pad 523through a solder 532, and then the semiconductor die 530 may be moldedwith a mold material 540.

When a laser beam (for example, an excimer laser beam), thermal beam,infrared beam, etc. is provided to the interface between the carrier 510and the first dielectric layer 511, an adhesiveness between the carrier510 and the first dielectric layer 511 may be reduced or eliminated. Atsuch point, the carrier 510 may be easily separated from the firstdielectric layer 511.

When the carrier 510 is removed, the first dielectric layer 511 may beexposed to the outside and subsequent processes (for example, theformation of the third dielectric layer 524 and the formation of thesecond conductive layer 525) may be performed.

Referring to FIG. 17, such figure shows a cross-sectional view of asemiconductor device 501, in accordance with various aspects of thepresent disclosure.

As shown in FIG. 17, the example semiconductor device 501 may comprisean interposer 520, a semiconductor die 530, a mold material 540, anunderfill 550, and a conductive interconnection structure 560. Thesemiconductor device 501 may, for example, share any or allcharacteristics with the example semiconductor device 500 shown in FIGS.15A-15H, and/or with any other semiconductor device presented herein(e.g., with regard to FIGS. 1-16, etc.).

The interposer 520, for example, comprises a first seed layer 521 a on afirst dielectric layer 511 (for example, a polyimide layer), a firstconductive layer 521 on the first seed layer 521 a, a second dielectriclayer 522 covering the first conductive layer 521, a second seed layer525 a below the first dielectric layer 511 and directly connected to thefirst seed layer 521 a, a second conductive layer 525 below the secondseed layer 525 a, and a third dielectric layer 524 covering the secondconductive layer 525. The line/space/thickness of the first conductivelayer 521 may, for example, be smaller than those of the secondconductive layer 525.

The interposer 520, or a general grouping of layers, may for examplecomprise a micro bump seed layer 525 a extending into and/or through thesecond dielectric layer 522 (e.g., via an opening formed therein) and onthe first conductive layer 521, a micro bump pad 523 on the micro bumpseed layer 525 a, an under bump seed layer 527 a below the secondconductive layer 525, and an under bump metal 527 below the under bumpseed layer 527 a. In an example implementation, the first seed layer 521a and the second seed layer 525 a are directly and electricallyconnected to each other.

The conductive bump 531 is on the semiconductor die 530 and theconductive bump 531 is electrically connected to the micro bump pad 523through the solder 532. The underfill 550 is between the semiconductordie 530 and the interposer 520, and the mold material 540 surrounds sideparts of the semiconductor die 530 and the underfill 550. In theillustrated example, the mold material 540 surrounds the side surfacesof the semiconductor die 530 and also the top surface thereof.

The conductive interconnection structure 560 may, for example, beconnected to the under bump metal 527 and may also be mounted on asubstrate as discussed herein.

Labels (1) and (2) shown in FIG. 17 may, for example, show a laminationand/or formation order. For example, in relation to the semiconductordevice 501, in accordance with various aspects of the presentdisclosure, a first portion of the interposer 520 is formed in thedirection (1) (e.g., building from the first dielectric layer 511) andthe semiconductor die 530 is electrically connected to such firstportion, and then the second remaining portion of the interposer 520 isformed in the direction (2) (e.g., building from the first dielectriclayer 511) and the conductive interconnection structure 560 is attachedto such second remaining portion.

Referring to FIGS. 18A to 18J, such figures show cross-sectional viewsillustrating a method of manufacturing a semiconductor device 600, inaccordance with various aspects of the present disclosure. The examplesemiconductor devices and/or methods illustrated at FIGS. 18A to 18Jmay, for example, share any or all characteristics with any or all ofthe other example semiconductor devices and/or methods presented herein(e.g., with regard to FIGS. 9A-9J, for example substituting a glass,ceramic, metal, or other type of carrier for the illustrated siliconcarrier 310, any other figure, or any portion thereof).

The example method of manufacturing the semiconductor device 600 may,for example, comprise providing a carrier 610 with a first dielectriclayer 611, forming a first conductive layer 621, forming a secondconductive layer 623, forming a micro bump pad 625, attaching asemiconductor die 630 and molding with a mold material 640, attaching awafer support system 1, removing the carrier 610, forming an opening 611a in the first dielectric layer 611, forming an under bump metal 627 inand/or around the opening 611 a, connecting a conductive interconnectionstructure 660, and separating the wafer support system 1.

As shown in FIG. 18A, during the forming or providing of the carrier 610with the first dielectric layer 611, the carrier 610, such as, forexample, a glass, porous ceramic, metal, etc. (e.g., with a planar topsurface and a planar bottom surface) is provided. The carrier 610, andthe providing or forming thereof, may for example share any or allcharacteristics with any carrier and discussed herein (e.g., the carrier110 of FIGS. 1-6, the carrier 210 of FIGS. 7-8, etc.).

A first dielectric layer 611, for example an organic dielectric layer(e.g., formed of polyimide, Benzo Cyclo Butene, Poly Benz Oxazole, etc.)may be (or may have been) formed on the surface of the carrier 610, forexample through a coating process. The first dielectric layer 611 and/orthe providing or forming thereof may, for example, share any or allcharacteristics with any dielectric layer and/or the forming thereofdiscussed herein (e.g., the first dielectric layer 411 of FIGS. 13-14,etc.).

As shown in FIG. 18B, during the forming of the first conductive layer621, which may also be referred to as a redistribution layer, the firstconductive layer 621 may be formed on the first dielectric layer. Thefirst conductive layer 621 and/or the forming thereof may, for example,share any or all characteristics with any other conductive layer and/orthe forming thereof discussed herein (e.g., with regard to FIGS. 9-12,etc.). In one example implementation, a first seed layer 621 a (see,e.g., FIG. 19) is formed on the first dielectric layer 611, and thefirst conductive layer 621 is formed on the first seed layer 621 a.

The first conductive layer 621 may then be covered with a seconddielectric layer 622. The second dielectric layer 622 and/or the formingthereof may, for example, share any or all characteristics with otherdielectric layers and/or the forming thereof discussed herein (e.g.,with regard to FIGS. 9-12, etc.).

The forming of the first conductive layer 621 (e.g., with or without aseed layer 621 a) and the second dielectric layer 622 may be repeatedany number of times (e.g., utilizing the same materials and/or processesor different respective materials and/or processes). The exampleillustrations in FIGS. 18C-18J show two formations of such layers. Assuch, the layers are provided with similar labels in the figures (e.g.,repeating the first conductive layer 621 and the second dielectric layer622).

In the example illustrated in FIG. 18, since the conductiveinterconnection structure 660 is later connected to the first conductivelayer 621, the line/space/thickness of the first conductive layer 621may, for example, be formed larger in comparison to theline/space/thickness of the second conductive layer 623 discussed below.The scope of this disclosure, however, is not limited to such relativedimensions.

As shown in FIG. 18C, during the forming of the second conductive layer623, the second conductive layer 623 is formed on the first conductivelayer 621 and/or on the second dielectric layer 622. In an exampleimplementation, a second seed layer 623 a (see, e.g., FIG. 19) is formedon a top surface the second dielectric layer 622 and/or in an opening(or aperture) thereof extending through the second dielectric layer 622to the first conductive layer 321, a second conductive layer 623 isformed on the second seed layer 623 a, and the second conductive layer623 is covered with the third dielectric layer 624. Also, an opening 624a may be formed in the third dielectric layer 624 so that a specificarea of the second conductive layer 623 corresponding to the opening 624a is exposed to the outside. The second conductive layer 623, the thirddielectric layer 624, and/or openings (or apertures) therein, and/or theformation thereof, may share any or all characteristics with the otherconductive layers, dielectric layers, and openings, and/or the formationthereof discussed herein (e.g., with regard to FIGS. 1-8, etc.). Forexample, such formation may be repeated any number of times.

As shown in FIG. 18D, during the forming of the micro bump pad 625 (orother pad, landing, attachment structure, die attachment structure,etc.) in the opening 624 a, the micro bump pad 625 is formed in theopening 624 a so that the micro bump pad 625 is electrically connectedto the second conductive layer 623. In an example implementation, amicro bump seed layer 625 a (see, e.g., FIG. 19) is formed at the insideof the opening 624 a (e.g., on the second conductive layer 623 exposedby the opening 624 a and/or on side walls of the opening 624 a) and/oroutside of the opening 624 a (e.g., on the top surface (in FIG. 18D) ofthe third dielectric layer 624). The micro bump seed layer 625 a may,for example, be formed utilizing the same material(s) and/or process(es)discussed herein with regard to other seed layers, or may be formedutilizing different respective material(s) and/or process(es). The microbump seed layer 625 a and/or micro bump pad 625 may also be referred toherein as a conductive layer.

The micro bump pad 625 may then, for example, be formed on the microbump seed layer 625 a. For example, in an example implementation, themicro bump seed layer 625 a is interposed between the second conductivelayer 623 and the micro bump pad 625. The micro bump pad 625 and/or theforming thereof may, for example, share any or all characteristics withany other pad or micro bump pad and/or the forming thereof discussedherein (e.g., with regard to FIGS. 9-12, FIGS. 1-6, etc.). The microbump seed layer 625 a and/or micro bump pad 625 may also be referred toherein as a conductive layer.

Though not illustrated in FIGS. 18A-18J, following formation of theunder bump metal 625, an edged trim (or profile) process may beperformed, for example in which an edge of the wafer being processed istrimmed (or profiled). Such trimming may be performed in a variety ofmanners, for example by grinding. Such edge trimming may, for example,protect the wafer from chipping and flaking during subsequentprocessing.

As shown in FIG. 18E, during the attaching of the semiconductor die 630and the molding with the mold material 640, the semiconductor die 630 iselectrically connected to the micro bump pad 625 and is molded with themold material 640. The semiconductor die 630 and/or the attachingthereof may share any or all characteristics with other semiconductordies and/or the attaching thereof discussed herein (e.g., with regard toFIGS. 9-12, FIGS. 1-6, etc.). For example, in an example scenario, asolder paste may be applied to the micro bump pad 126 utilizing astencil and squeegee, the conductive bump 631 of the semiconductor die630 may be positioned on or in the solder paste (e.g., utilizing apick-and-place process), and the solder paste may then be reflowed.After attachment of the semiconductor die 630, the assembly may becleaned (e.g., with hot DI water, etc.), subjected to a flux clean andbake process, subjected to a plasma treatment process, etc.

For example, the conductive bump 631 (or other conductive attachmentstructure) of the semiconductor die 630 is electrically connected to themicro bump pad 625 through the solder 632. The conductive bump 631 ofthe semiconductor die 630 may be attached to the micro bump pad 625 (orother pad or landing structure) in any of a variety of manners,non-limiting examples of which are presented herein. For example, theconductive bump 631 may be soldered to the micro bump pad 625 utilizingany of a variety of solder attachment processes (e.g., a mass reflowprocess, a thermal compression process, etc.), etc. Also for example,the conductive bump 631 may be coupled to the micro bump pad 625utilizing a conductive adhesive, paste, etc.

In an example implementation, an under fill 650 may be formed betweenthe semiconductor die 630 and the interposer 620 (e.g., the thirddielectric layer 624), for example, surrounding portions of theconductive bumps 631 and micro bump pads 625 that are exposed to theunderfill 650. The underfill 650, or the formation thereof, may shareany or all characteristics with other underfills discussed herein (e.g.,with regard to FIGS. 9-12, FIGS. 1-6, etc.).

In the molding process, the semiconductor die 630 and/or interposer 620may be encapsulated with a mold material 640 (e.g., a molding resin orother mold material or encapsulant), which may then be cured. The moldmaterial 640 and/or the forming thereof, may share any or allcharacteristics with other mold materials and/or the forming thereofdiscussed herein (e.g., with regard to FIGS. 9-12, FIGS. 1-6, etc.). Inan example implementation, the mold material 640 covers the sidesurfaces and top surface of the semiconductor die 630. In anotherexample implementation, the mold material 640 only covers the sidesurfaces of the semiconductor die 630 (or only respective portionsthereof), thus leaving the top surface of the semiconductor die 630exposed from the mold material 640. As discussed herein, the moldmaterial 640 may also be utilized to form a molded underfill, forexample instead of the underfill 650.

As shown in FIG. 18F, during the attaching of the wafer support system1, the wafer support system 1 is attached to the top surfaces of thesemiconductor die 630 and the mold material 640. In another exampleimplementation, when the mold material 640 covers the top surface of thesemiconductor die 630, the wafer support system 1 is attached to the topsurface of the mold material 640. The wafer support system 1 and/or theattachment thereof may, for example, share any or all characteristicswith other wafer support systems and/or the attachment thereof discussedherein (e.g., with regard to FIGS. 9-12, FIGS. 13-14, FIGS. 15-17, FIGS.1-8, etc.).

As shown in FIG. 18G, during the removing of the carrier 610, thecarrier 610 (for example, a glass wafer or panel) attached to the firstdielectric layer 611 is removed. The carrier 610 may be removed in anyof a variety of manners, non-limiting examples of which are providedherein. For example, the carrier 610 may be removed in any mannerdiscussed herein with regard to any of the other carriers discussedherein (e.g., with regard to FIGS. 13-14, 1-6, etc.). In an exampleimplementation, as a laser beam, thermal beam, or infrared beam isprovided to the carrier 610, the carrier 610 may be separated from thefirst dielectric layer 611. For example, in an example implementation,light or thermal energy may be provided to the interface of the carrier610 and the first dielectric layer 611 to reduce or eliminate adhesionbetween the carrier 610 and the first dielectric layer 611, at whichpoint the carrier 610 may be separated from the first dielectric layer611. In another example implementation, most (or all) of the carrier 610may be removed through a mechanical grinding process and then, theremaining carrier 610 (if any) may be removed through a chemical etchingprocess.

In an example scenario in which the entirety of the carrier 610 isremoved, only the first dielectric layer 611 (for example, a polyimidelayer) originally formed or provided on the surface of the carrier 610remains. For example, only the first dielectric layer 611 might remainon the bottom surfaces of the first conductive layer 621 and the seconddielectric layer 622.

As shown in FIG. 18H, during the forming of the openings 611 a (orapertures) in the first dielectric layer 611, a plurality of openings611 a are selectively formed in the first dielectric layer 611. Theopenings 611 a and/or the forming thereof may, for example, share any orall characteristics with other openings and/or the forming thereofdiscussed herein (e.g., with regard to FIGS. 1-6, FIGS. 7-8, etc.). Forexample, the openings 611 a may be formed in any of a variety of manners(e.g., mechanical and/or laser ablation, chemical etching, photo etchingprocess, photo-masking and etching process, etc.). Each of the openings611 a may, for example, correspond to a respective specific area of thefirst conductive layer 621 exposed to the outside by the opening 611 a.In an example implementation, an opening 611 a exposes a respectivespecific area of the first conductive layer 621 to the outside throughthe organic first dielectric layer 611. In an example implementation inwhich the first conductive layer 621 was formed on a first seed layer621 a, a specific area of the first seed layer 621 a on which the firstconductive layer 621 was formed is exposed to the outside through theorganic first dielectric layer 611.

Though the example illustration of FIG. 18H does not show a fourthdielectric layer formed on (e.g., directly on) the first dielectriclayer 611, for example as shown in FIG. 9H, such a layer may also beformed in the example of FIG. 18H.

As shown in FIG. 181, the under bump metal 627 is formed in and/or onthe opening 611 a, and the conductive interconnection structure 660, isattached to the under bump metal 627. The under bump metal 627 and/orthe forming thereof may share any or all characteristics with otherunder bump metals and/or the forming thereof discussed herein (e.g.,with regard to FIGS. 9-12, FIGS. 1-6, etc.). Additionally, theconductive interconnection structure 660 and/or the attachment thereofmay share any or all characteristics with other conductiveinterconnection structures and/or the attachment thereof discussedherein (e.g. with regard to FIGS. 9-12, FIGS. 1-6, etc.).

For example, an under bump seed layer 627 a (see, e.g., FIG. 19) may,for example, be formed at the inside of the opening 611 a (e.g., on sidewalls of the opening 611 a formed in the first dielectric layer 611,and/or on the first conductive layer 621 or corresponding seed layer 621a) and outside of the opening 611 a (e.g., on the bottom surface of thefirst dielectric layer 611 surrounding or encircling the opening 611 a).As discussed herein, the under bump seed layer 627 a may be formed usingthe same material(s) and/or process(es) as used to form any of the seedlayers discussed herein (e.g., with regard to FIGS. 9-12, FIGS. 1-6,etc.), or may be formed using different respective material(s) and/orprocess(es). The under bump seed layer 627 a may also be referred toherein as a conductive layer.

As the under bump metal 627 is formed on the opening 611 a of the firstdielectric layer 611 and the conductive interconnection structure 660 isconnected to the under bump metal 627, the conductive interconnectionstructure 660 is electrically connected to the first conductive layer621. In the example provided, the first seed layer 621 a and the underbump seed layer 627 a are directly and electrically connected to eachother, mutually facing each other. In an alternative configuration, thefirst conductive layer 621 may be formed on a first side of the firstseed layer 621 a, and the under bump metal layer 627 may be formed on asecond side of the first seed layer 621 a, for example without adedicated under bump seed layer 627 a being formed

For discussion purposes herein, the first conductive layer 621, thesecond dielectric layer 622, the second conductive layer 623, and thethird dielectric layer 624 may be considered to be components of aninterposer 620. Furthermore, the above-mentioned micro bump pad 625 andunder bump metal 627 also may be considered to be components of theinterposer 620.

As shown in FIG. 18J, during the separating of the wafer support system1, the wafer support system 1 is separated from the semiconductor die630 and/or the mold material 640. The wafer support system 1 and/or themethod of separating thereof may, for example, share any or allcharacteristics with any wafer support system and/or method ofseparating thereof discussed herein (e.g., with regard to FIGS. 9-12,FIGS. 1-6, etc.).

In the completed example semiconductor device 600, the top surface ofthe semiconductor die 630 may, for example, be exposed to the outsidethrough the top surface of the mold material 640. For example, the topsurface of the semiconductor die 630 and the top surface of the moldmaterial 640 may be coplanar. In another example implementation, themold material 640 may cover the top surface of the semiconductor die630.

As with any or all of the examples discussed herein (e.g., with regardto FIGS. 1-17, etc.), the interposer 620 (or package 600) may, forexample, be formed in a mass configuration or as a single unit. Asdiscussed herein, in an example scenario in which the interposer 620 (orpackage 600) is formed in a mass configuration, a singulation processmay be performed.

Referring to FIG. 19, such figure shows a cross-sectional viewillustrating a semiconductor device 601, in accordance with variousaspects of the present disclosure.

As shown in FIG. 19, the example semiconductor device 601 may comprisean interposer 620, a semiconductor die 630, a mold material 640, anunderfill 650, and a conductive interconnection structure 660. Thesemiconductor device 601 may, for example, share any or all aspects withthe example semiconductor device 600 shown in FIGS. 18A-18J, and/or anyother semiconductor device presented herein (e.g., with respect to FIGS.1-17, etc.).

The interposer 620 may, for example, comprises a first seed layer 621 aabove a first dielectric layer 611 (for example, a polyimide layer), afirst conductive layer 621 on the first seed layer 621 a, a seconddielectric layer 622 covering the first conductive layer 621, a secondseed layer 623 a on the first conductive layer 621, a second conductivelayer 623 on the second seed layer 623 a, and a third dielectric layer624 covering the second conductive layer 623. The line/space/thicknessof the first conductive layer 621 may, for example, be larger than thatof the second conductive layer 623.

The interposer 620, or general grouping of layers, may for examplecomprise a micro bump seed layer 625 a extending into and/or through thethird dielectric layer 624 (e.g., via an opening formed therein) and onthe second conductive layer 623, a micro bump pad 625 on the micro bumpseed layer 625 a, an under bump seed layer 627 a below the firstconductive layer 621, and an under bump metal 627 below the under bumpseed layer 627 a. In an example implementation, the first seed layer 621a and the under bump seed layer 627 a are directly and electricallyconnected to each other.

The conductive bump 631 is on the semiconductor die 630, and theconductive bump 631 is electrically connected to the micro bump pad 625through the solder 632. The underfill 650 is between the semiconductordie 630 and the interposer 620 (e.g., the third dielectric layer 624),and the mold material 640 surrounds side parts of the semiconductor die630 and the underfill 650. In the illustrated example, the mold material640 surrounds the side surfaces of the semiconductor die 630 and alsothe top surface thereof.

The conductive interconnection structure 660 may, for example, beconnected to the under bump metal 627 and may also be mounted on asubstrate, as discussed herein.

Labels (1) and (2) shown in FIG. 19 may, for example, show a laminationand/or formation order. For example, in relation to the semiconductordevice 601, in accordance with various aspects of the presentdisclosure, the interposer 620 (or a first portion thereof) is formed inthe direction (1) (e.g., building from the first dielectric layer 611)and the semiconductor die 630 is connected to the interposer 620, andthen under bump seed layer 627 a and under bump metal 627 (which may,for example, be considered a second portion of the interposer 620) andthe conductive interconnection structure 660 is connected to theinterposer 320 in the direction (2) (e.g., building from the firstconductive layer 621 or first seed layer 621 a).

Referring to FIGS. 20A to 20J, such figures show cross-sectional viewsillustrating a method of manufacturing a semiconductor device 700, inaccordance with various aspects of the present disclosure. The examplesemiconductor devices and/or methods illustrated in FIGS. 20A to 20Jmay, for example, share any or all characteristics with any or all ofthe other example semiconductor devices and/or methods presented herein(e.g., with regard to FIGS. 1A to 1J, FIGS. 2-6, etc.).

The example manufacturing method may, for example, comprise providing acarrier 710, forming a first dielectric layer 711, forming a firstconductive layer 721, forming a second conductive layer 723 and an underbump metal 725, attaching a first wafer support system 1, removing thecarrier 710, forming a micro bump pad 726 at the first conductive layer721, attaching a semiconductor die 730 and molding with a mold material740, attaching a second wafer support system 2 and separating the firstwafer support system 1 and attaching a conductive interconnectionstructure 760, and separating the second wafer support system 2.

As shown in FIG. 20A, during the providing (or forming) of the carrier710, the carrier 710 such as, for example, a silicon wafer with a planartop surface and a planar bottom surface is provided. The carrier 710 maycomprise any of a variety of different types of carrier materials. Thecarrier 710 may, for example, comprise a semiconductor material (e.g.,silicon, GaAs, etc.), glass, ceramic (e.g., porous ceramic, etc.),metal, etc. In an example implementation, the carrier 710 does not haveany inorganic layer such as silicon oxide, silicon nitride or siliconoxide/silicon nitride on the top surface thereof. Further, if thecarrier has a native oxide layer on the top surface, the native oxidelayer may be removed using for example a chemical solution. As theresult of removing the native oxide layer, the top surface of thecarrier 710 may have a clean surface.

As shown in FIG. 20B, during the forming of the first dielectric layer711, the first dielectric layer 711 such as, for example, an organiclayer (e.g., polymers such as polyimide, Benzocyclobutene (BCB),Polybenzoxazole (PBO), equivalents thereof, combinations thereof, etc.)may be (or may have been) formed on the top surface of the carrier 710.The first dielectric layer 711 may be formed by one or more of, forexample, spin coating, spray coating, dip coating, rod coating andequivalents thereof, but the scope of this disclosure is not limitedthereto. As an example, the first dielectric layer 711 may be formed bylaminating a dry film. The first dielectric layer 711 may also bereferred to as a passivation layer. Further, an opening 711 a (oraperture) may be formed in the first dielectric layer 711 using one ormore of, for example, a photolithography process, laser and/ormechanical ablation process, chemical etching, and equivalents thereof,but of the scope of this disclosure is not limited thereto. Therefore, aspecific area of the top surface of the carrier 710 is directly and/orpartially exposed to the outside through the opening 711 a.

As shown in FIG. 20C, during the forming of the first conductive layer721 (e.g., a redistribution layer), the first conductive layer 721 maybe formed on the top surface of the carrier 710. In one exampleimplementation, a first seed layer 721 a (see, e.g., FIG. 21) is formedon the exposed surface of the carrier 710 via the opening 711 a and thefirst dielectric layer 711, and the first conductive layer 721 is formedon the first seed layer 721 a. The first conductive layer 721 may thenbe covered with a second dielectric layer 722, which may also bereferred to as a passivation layer.

Formation of the first conductive layer 721 (e.g., with or without aseed layer 721 a) and the second dielectric layer 722 may be repeatedany number of times (e.g., utilizing the same materials and/or processesor different respective materials and/or processes). The exampleillustrations in FIGS. 20C-20D show two formations of such layers. Assuch, the layers are provided with similar labels in the figures (e.g.,repeating the first conductive layer 721 and the second dielectric layer722).

An opening 722 a (or aperture) may, for example, be formed in the seconddielectric layer 722, and a specific area of the first conductive layer721 may be exposed to the outside through the opening 722 a. The opening722 a may be formed in any of a variety of manners (e.g., mechanicaland/or laser ablation, chemical etching, etc.). Note that the seconddielectric layer 722 (or any dielectric layer discussed herein) may alsobe originally formed having opening 722 a, for example by masking, orother selective dielectric layer formation process.

As shown in FIG. 20D, during the forming of the second conductive layer723 and the under bump metal 725, the second conductive layer 723 andunder bump metal 725 of at least one layer are formed on the firstconductive layer 721 and/or on the second dielectric layer 722. In oneexample implementation, a second seed layer 723 a (see, e.g., FIG. 21)is formed at the inside of the opening 722 a (e.g., on side walls of theopening 722 a formed in the second dielectric layer 722 and/or on thefirst conductive layer 721 exposed by the opening 722 a) and/or outsideof the opening 722 a (e.g., on the top surface of the second dielectriclayer 722). As discussed herein, the second seed layer 723 a may beformed using the same material(s) and/or process(es) as used to form thefirst seed layer 721 a, or may be formed using different respectivematerial(s) and/or process(es). The second seed layer 723 a (or any seedlayer discussed herein) may also be referred to herein as a conductivelayer.

Continuing the example implementation, the second conductive layer 723is formed on the second seed layer 723 a. For example, the secondconductive layer 723 may be formed to fill (or at least cover sidesurfaces of) the opening 722 a in the second dielectric layer 722. Thesecond conductive layer 723 may, for example, be formed using the samematerial(s) and/or processes as the first conductive layer 721, or maybe formed using different respective material(s) and/or process(es). Thesecond conductive layer 723 may also be referred to herein as aredistribution layer.

The second conductive layer 723 may then, for example, be covered withthe third dielectric layer 724. The third dielectric layer 724 may beformed of any of a variety of materials and/or utilizing any of avariety of dielectric-forming processes. For example, the thirddielectric layer 724 may be formed utilizing the same material(s) and/orprocess(es) as utilized to form the second dielectric layer 722.

An opening 724 a (or aperture) may, for example, be formed in the thirddielectric layer 724, and a specific area of the second conductive layer723 may be exposed to the outside through the opening 724 a. The opening724 a may be formed in any of a variety of manners (e.g., mechanicaland/or laser ablation, chemical etching, etc.). Alternatively, forexample, the third dielectric layer 724 may be originally formed withthe opening 724 a therein.

An under bump seed layer 725 a (see, e.g., FIG. 21) may, for example, beformed at the inside of the opening 724 a and/or outside of the opening724 a. The under bump seed layer 725 a and/or the forming thereof may,for example, share any or all characteristics with any other under bumpseed layer and/or the forming thereof discussed herein (e.g., the underbump seed layer 125 a discussed herein with regard to FIGS. 1, 2-6,etc.).

An under bump metal 725 is formed on the under bump seed layer 725 a.The under bump metal 725 and/or the forming thereof may, for example,share any or all characteristics with any under bump metal and/or theforming thereof (e.g., the under bump metal 125 and/or the formingthereof discussed herein with regard to FIGS. 1, 2-6, etc.).

As shown in FIG. 20E, during the attaching of the first wafer supportsystem 1 (WSS), the first wafer support system 1 is attached to thethird dielectric layer 724. For example, the first wafer support system1 may be attached to the third dielectric layer 724 and to the underbump metal 725. At this point, the carrier 110 that is shown at thebottom of FIG. 20D is repositioned to the top of FIG. 20E (e.g., thediagram is inverted). The first WSS 1 and/or the attaching thereof may,for example, share any or all characteristics with any other wafersupport system and/or the attaching thereof (e.g., the first WSS 1discussed herein with regard to FIGS. 1 and 2-6, etc.).

As shown in FIG. 20F, during the removing of the carrier 710, thecarrier 710 (for example, a silicon wafer on which the first dielectriclayer 711 was formed) on a side of the structure opposite the firstwafer support system 1 is removed. In an example implementation, most ofthe carrier 710 may be removed through a mechanical grinding process andthen, the remaining carrier 710 may be removed through a chemicaletching process. For example, a silicon carrier may be ground to 10-30μm thickness, and then the remainder may be removed by a process otherthan grinding (e.g., by chemical etching, etc.). In such a manner, as aresult, the first dielectric layer 711 and a specific area of the firstconductive layer 721 (e.g., more specifically the first seed layer 721a, see, e.g., FIG. 21) formed on the surface of the carrier 710 areexposed to the outside. For example, the specific area of the firstconductive layer 721 (e.g., more specifically the first seed layer 721a, see, e.g., FIG. 21) is exposed to the outside through the firstdielectric layer 711. Note that the first seed layer 721 a may beremoved at this point if desired.

As shown in FIG. 20G, during the forming of the micro bump pad 726 (orother pad, land, attachment structure, die attachment structure, etc.),the micro bump pad 726 is formed on the first conductive layer 721(e.g., more specifically the first seed layer 721 a, see, e.g., FIG.21). For example, the micro bump pad 726 is electrically connected tothe first conductive layer 721 (e.g., directly connected, connected viaa seed layer, etc.). In an example implementation, the micro bump seedlayer 726 a (e.g., as shown in FIGS. 21) may be formed on the firstconductive layer 721 (e.g., more specifically the first seed layer 721a) and/or around the exposed first conductive layer 721 (e.g., on thetop surface (in FIG. 20G) of the first dielectric layer 711 surroundingthe exposed first conductive layer 721). The micro bump seed layer 726 amay, for example, be formed utilizing the same material(s) and/orprocess(es) discussed herein with regard to other seed layers orconductive layers, or may be formed utilizing different respectivematerial(s) and/or process(es). The micro bump seed layer 726 a and/ormicro bump pad 726 may also be referred to herein as a conductive layer.

The micro bump pad 726 may then, for example, be formed on the microbump seed layer 726 a. In an example implementation, the first seedlayer 721 a (e.g., on which the first conductive layer 721 was formed)and the micro bump seed layer 726 a (e.g., on which the micro bump pad726 is formed) may be interposed between the first conductive layer 721and the micro bump pad 726. For example, the first seed layer 721 a andthe micro bump seed layer 726 a may be directly connected to each other,mutually facing each other. Note that in various exampleimplementations, the forming of the micro bump seed layer 726 a might beskipped, and the micro bump pad 726 formed on the first seed layer 721 aexposed from the first dielectric layer 711 (e.g., in an exampleimplementation in which the first seed layer 721 a is adequately formedto be utilized in such manner). The micro bump pad 726 and/or theforming thereof may, for example, share any or all characteristics withany micro bump and/or the forming thereof discussed herein (e.g., themicro bump pad 126 and/or the forming thereof discussed herein withregard to FIGS. 1 and 2-6, etc.).

For discussion purposes herein, the first dielectric layer 711, thefirst conductive layer 721, the second dielectric layer 722, the secondconductive layer 723, and the third dielectric layer 124 may beconsidered to be components of an interposer 720. Furthermore, the underbump metal 725 and the micro bump pad 726 described herein may also beconsidered to be components of the interposer 720.

As shown in FIG. 20H, during the attaching of the semiconductor die 730and the molding with the mold material 740, the semiconductor die 730 iselectrically connected to the micro bump pad 726 and is molded with themold material 740. For example, the conductive bump 731 (or otherconductive attachment structure, for example conductive pillar, etc.) ofthe semiconductor die 730 is electrically connected to the micro bumppad 726 through the solder 732. The conductive bump 731 and/or theforming thereof may, for example, share any or all characteristics withany conductive bump and/or the forming thereof discussed herein (e.g.,the conductive bump 131 and/or the forming thereof discussed herein withregard to FIGS. 1 and 2-6, etc.).

In an example implementation, an underfill 750 may be formed between thesemiconductor die 730 and the first dielectric layer 711, for examplesurrounding portions of the conductive bumps 731 and micro bump pads 726that are exposed to (and thus encapsulated by) the underfill 750. Theunderfill 750 and/or the forming thereof may, for example, share any orall characteristics with any underfill and/or the forming thereofdiscussed herein (e.g., the underfill 150 and/or the forming thereofdiscussed herein with regard to FIGS. 1 and 2-6, etc.).

In the molding (or encapsulating) process, the semiconductor die 730and/or interposer 720 may be encapsulated with a mold material 740(e.g., a molding resin or other mold material or encapsulant), which maythen be cured. In an example implementation, the mold material 740 onlycovers the side surfaces of the semiconductor die 730 (or onlyrespective portions thereof), thus leaving the top surface of thesemiconductor die 730 exposed from the mold material 740. In anotherexample implementation, the mold material 740 covers the side surfacesand the top surface of the semiconductor die 730. The mold material 740and/or the forming thereof may, for example, share any or allcharacteristics with any mold material and/or the forming thereofdiscussed herein (e.g., the mold material 140 and/or the forming thereofdiscussed herein with regard to FIGS. 1 and 2-6, etc.).

As shown in FIG. 201, during the attaching of the second wafer supportsystem (WSS) 2, the separating of the first wafer support system 1, andthe attaching of the conductive interconnection structure 760, thesecond WSS 2 may be attached to the semiconductor die 730 and/or moldmaterial 740. The WSS 2 and/or the attaching thereof may, for example,share any or all characteristics with any wafer support system and/orthe attaching thereof discussed herein (e.g., the WSS 2 and/or theattaching thereof discussed herein with regard to FIGS. 1 and 2-6,etc.).

After attachment of the second WSS 2, the first wafer support system 1attached to the third dielectric layer 724 is separated from the thirddielectric layer 724 and/or under bump metal 725. Therefore, the underbump metal 725 is exposed to the outside. The separating of the firstWSS 1 may, for example, share any or all characteristics with theseparating of any wafer support system discussed herein (e.g., theseparating of the first WSS 1 discussed herein with regard to FIGS. 1,and 2-6, etc.).

The conductive interconnection structure 760 (or a plurality thereof)may be electrically connected to the exposed under bump metal 725 (e.g.,exposed after removal of the first WSS 1). At this point, for examplewhile the second wafer support system 2 is attached to the semiconductordie 730 and the mold material 740, the conductive interconnectionstructure 760 may be electrically connected to the under bump metal 725.The conductive interconnection structure 760 and/or the forming thereofmay, for example, share any or all characteristics with any conductiveinterconnection structure and/or the forming thereof discussed herein(e.g., the interconnection structure 160 or the formation thereofdiscussed herein with regard to FIGS. 1 and 2-6, etc.).

As shown in FIG. 20J, during the separating of the second wafer supportsystem 2, the second wafer support system 2 attached to thesemiconductor die 730 and/or the mold material 740 is separated from thesemiconductor die 730 and/or mold material 740. The separating of thesecond WSS 2 may, for example, share any or all characteristics with theseparating of any wafer support system discussed herein (e.g., theseparating of the second WSS 2 discussed herein with regard to FIGS. 1and 2-6, etc.).

Referring to FIG. 21, such figure shows a cross-sectional viewillustrating a semiconductor device 701, in accordance with variousaspects of the present disclosure.

As shown in FIG. 21, the example semiconductor device 701 may comprisean interposer 720, a semiconductor die 730, a mold material 741, anunderfill 750, and a conductive interconnection structure 760. Thesemiconductor device 701 may, for example, share any or allcharacteristics with any or all other semiconductor devices presentedherein (e.g., the example semiconductor device 700 shown in FIGS.20A-20J, etc.).

The interposer 720, or general grouping of layers, may for examplecomprise a first seed layer 721 a in and/or below a first dielectriclayer 711 (e.g., polymers such as polyimide, Benzocyclobutene (BCB),Polybenzoxazole (PBO), equivalents thereof, combinations thereof, etc.),a first conductive layer 721 below the first seed layer 721 a, a seconddielectric layer 722 covering the first conductive layer 721 (orportions thereof), a second seed layer 723 a below the first conductivelayer 721, a second conductive layer 723 below the second seed layer 723a, and a third dielectric layer 724 covering the second conductive layer723 (or portions thereof). The line/space/thickness of the firstconductive layer 721 may, for example, be smaller than those of thesecond conductive layer 723.

The interposer 720 may, for example, comprise a micro bump seed layer726 a extending on the first dielectric layer 111 and on the first seedlayer 721 a, a micro bump pad 726 on the micro bump seed layer 726 a, anunder bump seed layer 725 a below the second conductive layer 723, andan under bump metal 725 below the under bump seed layer 725 a. In anexample implementation, the first seed layer 721 a and the micro bumpseed layer 726 a are directly and electrically connected to each other.

The conductive bump 731 is on the semiconductor die 730, and theconductive bump 731 is electrically connected to the micro bump pad 726through the solder 732. The underfill 750 is between the semiconductordie 730 and the interposer 720 (e.g., the first dielectric layer 711),and the mold material 741 surrounds side and top surfaces of thesemiconductor die 730 and the underfill 750.

As discussed herein, the mold material 741 may surround (or cover) thetop surface and the side surfaces of the semiconductor die 730. Forexample, in the example semiconductor device 701, the mold material 741may completely cover the top surface in addition to the side surfaces ofthe semiconductor die 730. Since the semiconductor die 730 is generallysurrounded at top and side surfaces by the mold material 741, thesemiconductor die 730 may be protected from an external environment. Inanother example implementation, the mold material 741 surrounds only theside surfaces of the semiconductor die 730 but does not surround (orcover) the top surface, therefore the top surface of the semiconductordie 730 may be exposed to the outside. Furthermore, the top surface ofthe semiconductor die 730 and the top surface of the mold material 741may be coplanar.

The conductive interconnection structure 760 may, for example, beconnected to the under bump metal 726 and may also be mounted on asubstrate as discussed herein.

Referring to FIGS. 22A to 22J, such figure show cross-sectional viewsillustrating a method of manufacturing a semiconductor device 800, inaccordance with various aspects of the present disclosure. The examplesemiconductor devices and/or methods illustrated in FIGS. 22A to 22Jmay, for example, share any or all characteristics with any or all ofthe other example semiconductor devices and/or methods presented herein(e.g., with regard to FIGS. 1A to 1J, FIGS. 2-6, 20A to 20J, 21, etc.).

The example method of manufacturing the semiconductor device 800 may,for example, comprise providing a carrier 810, forming an under bumpmetal 821, forming a first conductive layer 823, forming a secondconductive layer 825, forming a micro bump pad 827, attaching asemiconductor die 830 and molding with a mold material 840, attaching awafer support system 1, removing the carrier 810, connecting aconductive interconnection structure 860, and separating the wafersupport system 1.

As shown in FIG. 22A, during the forming or providing of the carrier810, the carrier 810, such as, for example, a silicon wafer with aplanar top surface and a planar bottom surface, is provided.

As shown in FIGS. 22B and 22C, during the forming of the under bumpmetal 821, the under bump metal 821 of at least one layer is directlyformed on the carrier 810. In one example implementation, the under bumpmetal 821 may be formed of any of a variety of materials, non-limitingexamples of which are presented herein. For example, the under bumpmetal 821 may be formed of at least one of chrome, nickel, palladium,gold, silver, alloys thereof, combinations thereof, equivalents thereof,etc. The under bump metal 821 may, for example, comprise Ni and Au. Thenunder bump metal 821 may also, for example, comprise Cu, Ni, and Au. Theunder bump metal 821 may be also formed utilizing any of a variety ofprocesses, non-limiting examples of which are presented herein. Forexample, the under bump metal 821 may be formed utilizing one or more ofan electroless plating process, electroplating process, sputteringprocess, etc. on the carrier 810. The under bump metal 821 may, forexample, prevent or inhibit the formation of an intermetallic compoundat the interface between the conductive interconnection structure 860and the first conductive layer 823, thereby improving the reliability ofthe connection to the conductive interconnection structure 860. Notethat the under bump metal 821 may comprise multiple layers on thecarrier 810. For example, the under bump metal 821 may comprise a firstlayer of Ni and a second layer of Au.

Further, the under bump metal 821 may then be covered with a firstdielectric layer 822 such as an organic layer (e.g., polymers such aspolyimide, Benzocyclobutene (BCB), Polybenzoxazole (PBO), equivalentsthereof, combinations thereof, etc.), which may also be referred to as apassivation layer. For example, the first dielectric layer 822 may beformed on the under bump metal 821 and the top surface of the carrier810. The first dielectric layer 822 may be formed utilizing one or moreof spin coating, spray coating, dip coating, rod coating, equivalentsthereof, combinations thereof, etc., but the scope of the presentdisclosure is not limited thereto. As an example, the first dielectriclayer 822 may be formed by laminating a dry film.

An opening 822 a (or aperture) may, for example, be formed in the firstdielectric layer 822, and a specific area of the under bump metal 821(e.g., the entire top surface, a portion of the top surface, a centerregion of the top surface, etc.) may be exposed to the outside throughthe opening 822 a. The opening 822 a may be formed in any of a varietyof manners (e.g., mechanical and/or laser ablation, chemical etching,photolithography, etc.). Note that the second dielectric layer 122 (orany dielectric layer discussed herein) may also be originally formedhaving opening 122 a, for example by masking, or other selectivedielectric layer formation process.

As shown in FIGS. 22D, during the forming of the first conductive layer823, which may also be referred to as a redistribution layer, the firstconductive layer 823 may be formed on the under bump metal 821 and thefirst dielectric layer 822. For example, the first conductive layer 823may be coupled to the under bump metal 821. In one exampleimplementation, a first seed layer 823 a (see, e.g., FIG. 23) is formedon the under bump metal 821 and first dielectric layer 822, and thefirst conductive layer 823 is formed on the first seed layer 823 a. Thefirst conductive layer 823 and/or the forming thereof may, for example,share any or all characteristics with any other conductive layer and/orthe forming thereof discussed herein.

The first conductive layer 823 may then be covered with a seconddielectric layer 824. The second dielectric layer 824 may also bereferred to as a passivation layer. The second dielectric layer 824and/or the forming thereof may, for example, share any or allcharacteristics with any other dielectric layer and/or the formingthereof discussed herein.

An opening 824 a (or aperture) may, for example, be formed in the seconddielectric layer 824, and a specific area of the first conductive layer823 may be exposed to the outside through the opening 824 a. The opening824 a and/or the forming thereof may, for example, share any or allcharacteristics with any other dielectric layer opening and/or theforming thereof discussed herein.

In the example illustrated in FIG. 22, since the conductiveinterconnection structure 860 is later connected to the first conductivelayer 823 via the under bump metal 821, the line/space/thickness of thefirst conductive layer 823 may, for example, be formed larger incomparison to the line/space/thickness of the second conductive layer825 discussed below. The scope of this disclosure, however, is notlimited to such relative dimensions.

As shown FIG. 22E, forming of a second conductive layer 825, the secondconductive layer 825 is formed on the first conductive layer 823 and/oron the second dielectric layer 824. In an example implementation, asecond seed layer 825 a (see, e.g., FIG. 23) is formed on a top surfaceof the second dielectric layer 824 and/or in an opening (or aperture)824 a thereof extending through the second dielectric layer 824 to thefirst conductive layer 823 (e.g., on side walls of the opening 824 a).The seed layer 825 a and/or the forming thereof may, for example, shareany or all characteristics with any seed layer and/or the formingthereof discussed herein. The second conductive layer 825 is then formedon the second seed layer 825 a. The second conductive layer 825 and/orthe forming thereof may, for example, share any or all characteristicswith any conductive layer and/or the forming thereof discussed herein.The second conductive layer 825 is then covered with the thirddielectric layer 826, which may also be referred to as a passivationlayer. The third dielectric layer 826 and/or the forming thereof may,for example, share any or all characteristics with any dielectric layerand/or the forming thereof discussed herein. Also, an opening 826 a maybe formed in the third dielectric layer 826 so that a specific area ofthe second conductive layer 825 corresponding to the opening 826 a isexposed to the outside. The opening 826 a and/or the forming thereofmay, for example, share any or all characteristics with any otherdielectric layer opening and/or the forming thereof discussed herein.

Further, the forming of the second conductive layer 825 (e.g., with orwithout a seed layer 825 a) and the third dielectric layer 826 may berepeated any number of times (e.g., utilizing the same materials and/orprocesses or different respective materials and/or processes). Theexample illustrations in FIG. 22E shows two formations of such layers.As such, the layers are provided with similar labels in the figures(e.g., repeating the second conductive layer 825 and the thirddielectric layer 826).

As shown in FIG. 22F, during the forming of the micro bump pad 827 inthe opening 826 a, the micro bump pad 827 is formed in the opening 826 aso that the micro bump pad 827 is electrically connected to the secondconductive layer 825. In an example implementation, a micro bump seedlayer 827 a (see, e.g., FIG. 23) is formed at the inside of the opening826 a (e.g., on the second conductive layer 825 exposed by the opening826 a and/or on side walls of the opening 826 a) and/or outside of theopening 826 a (e.g., on the top surface (in FIG. 23) of the thirddielectric layer 826). The micro bump seed layer 827 a and/or theforming thereof may, for example, share any or all characteristics withany other seed layer (e.g., micro bump seed layer, etc.) and/or theforming thereof discussed herein.

The micro bump pad 827 may then, for example, be formed on the microbump seed layer 827 a. For example, in an example implementation, themicro bump seed layer 827 a is interposed between the second conductivelayer 825 and the micro bump pad 827. The micro bump pad 827 and/or theforming thereof may, for example, share any or all characteristics withany other micro bump pad and/or the forming thereof discussed herein.

For discussion purposes herein, the under bump metal 821, the firstdielectric layer 822, the first conductive layer 823, the seconddielectric layer 824, the second conductive layer 825, the thirddielectric layer 826 and the micro bump pad 827 may be considered to becomponents of an interposer 820.

As shown in FIG. 22G, during the attaching of the semiconductor die 830and the molding with the mold material 840, the semiconductor die 830 iselectrically connected to the micro bump pad 827 and is molded with themold material 840. For example, the conductive bump 831 (or otherconductive attachment structure) of the semiconductor die 830 iselectrically connected to the micro bump pad 827 through the solder 832.The conductive bump 831 of the semiconductor die 830 may be attached tothe micro bump pad 827 in any of a variety of manners, non-limitingexamples of which are presented herein. For example, the conductive bump831 may be soldered to the micro bump pad 827 utilizing any of a varietyof solder attachment processes (e.g., a mass reflow process, a thermalcompression process, etc.). Also for example, the conductive bump 831may be coupled to the micro bump pad 827 utilizing a conductiveadhesive, paste, etc. The conductive bump 831 and/or the forming thereofmay, for example, share any or all characteristics with any conductivebump and/or the forming thereof discussed herein.

In an example implementation, an underfill 850 may be formed between thesemiconductor die 830 and the interposer 820 (e.g., the third dielectriclayer 826), for example, surrounding portions of the conductive bumps831 and micro bump pads 827 that are exposed to (and thus encapsulatedby) the underfill 850. The underfill 850 and/or the forming thereof may,for example, share any or all characteristics with any underfill and/orthe forming thereof discussed herein.

In the molding (or encapsulating) process, the semiconductor die 830and/or interposer 820 may be encapsulated with a mold material 840(e.g., a molding resin or other mold material or encapsulant), which maythen be cured. In an example implementation, the mold material 840 onlycovers the side surfaces of the semiconductor die 830 (or onlyrespective portions thereof), thus leaving the top surface of thesemiconductor die 330 exposed from the mold material 340. In anotherexample implementation, the mold material 340 covers the side surfacesand the top surface of the semiconductor die 830. The mold material 840and/or the forming thereof may, for example, share any or allcharacteristics with any mold material and/or the forming thereofdiscussed herein.

As shown in FIG. 22H, during the attaching of the wafer support system(WSS) 1, the wafer support system 1 is attached to the top surfaces ofthe semiconductor die 830 and the mold material 840. In another exampleimplementation, when the mold material 840 covers the top surface of thesemiconductor die 830, the wafer support system 1 is attached to the topsurface of the mold material 840. The wafer support system 1 and/or theattaching thereof may, for example, share any or all characteristicswith any wafer support system and/or the attaching thereof discussedherein.

As shown in FIG. 221, during the removing of the carrier 810, thecarrier 810 (for example, a silicon wafer) attached to the under bumpmetal 821 and the first dielectric layer 822 is removed. For example,most or all of the carrier 810 may be removed through a mechanicalgrinding process and then, any remaining carrier 810 may be removedcompletely through a chemical etching process. The removing of thecarrier 810 may, for example, share any or all characteristics with anycarrier removing discussed herein. In an example implementation, afterremoval of the carrier 810, the under bump metal 821 may be exposed tothe outside through the first dielectric layer 822 (for example, organiclayer), and the bottom surfaces of the under bump metal 821 and thefirst dielectric layer 822 may be coplanar.

As shown in FIG. 221, during the connecting of the conductiveinterconnection structure 860, the conductive interconnection structure860 (or a plurality thereof) is connected to the under bump metal 821.For example, the conductive interconnection structure 860 iselectrically connected to the first conductive layer 823 via the underbump metal 821. The conductive interconnection structure 860 and/or theforming thereof may, for example, share any or all characteristics withany other interconnection structure and/or the forming thereof discussedherein.

As shown in FIG. 22J, during the separating of the wafer support system1, the wafer support system 1 is separated from the semiconductor die830 and/or the mold material 840. The separating of the wafer supportsystem 1 may, for example, share any or all characteristics with anywafer support system separating discussed herein.

In the completed example semiconductor device 800, the top surface ofthe semiconductor die 830 may, for example, be exposed to the outsidethrough the top surface of the mold material 840. For example, the topsurface of the semiconductor die 830 and the top surface of the moldmaterial 840 may be coplanar. In another example implementation, themold material 840 may cover the top surface of the semiconductor die830.

As described above, the example semiconductor device 800 according tovarious aspects of the present disclosure may be completed by formingthe interposer on a carrier in a build-up or stack manner, electricallyconnecting the semiconductor die to the interposer, molding thesemiconductor die with molding material, removing the carrier andforming the conductive interconnection structure on the interposer.Therefore, in the semiconductor device 800, misalignment between thefirst conductive layer and the under bump metal is reduced oreliminated. In addition, in the example semiconductor device 800, theunder bump metal is first formed and the conductive layer, dielectriclayer, and micro bump are then formed, thereby simplifying overallfabrication process of the semiconductor device 800.

Referring to FIG. 23, such figure shows a cross-sectional viewillustrating a semiconductor device 801, in accordance with variousaspects of the present disclosure.

As shown in FIG. 23, the example semiconductor device 801 may comprisean interposer 820, a semiconductor die 830, a mold material 841, anunderfill 850, and a conductive interconnection structure 860. Thesemiconductor device 801 may, for example, share any or all aspects withthe example semiconductor device 800 shown in FIGS. 22A-22J, and/or withany other semiconductor device presented herein.

The interposer 820 may, for example, comprise an under bump metal 821, afirst dielectric layer 822, a first seed layer 823 a above the underbump metal 821 and the first dielectric layer 822 (for example, anorganic layer), a first conductive layer 823 on the first seed layer 823a, a second dielectric layer 824 covering the first conductive layer823, a second seed layer 825 a on the first conductive layer 823, asecond conductive layer 825 on the second seed layer 825 a, and a thirddielectric layer 826 covering the second conductive layer 825. Theline/space/thickness of the first conductive layer 823 may, for example,be larger than those of the second conductive layer 825. Further, theinterposer 820, or general grouping of layers, may for example comprisea micro bump seed layer 827 a extending into and/or through the thirddielectric layer 826 (e.g., via an opening formed therein) and on thesecond conductive layer 825 and a micro bump pad 827 on the micro bumpseed layer 827 a. In an example implementation, the micro bump seedlayer 827 a and the second conductive layer 825 are directly andelectrically connected to each other.

The conductive bump 831 is on the semiconductor die 830, and theconductive bump 831 is electrically connected to the micro bump pad 827through the solder 832. The underfill 850 is between the semiconductordie 830 and the interposer 820 (e.g., the third dielectric layer 826),and the mold material 841 surrounds side and top surfaces of thesemiconductor die 830 and the underfill 850.

The conductive interconnection structure 860 may, for example, beconnected to the under bump metal 821 and may also be mounted on asubstrate, as discussed herein.

In summary, various aspects of this disclosure provide a method formanufacturing a semiconductor device, for example comprising providingan interposer without through silicon vias. Various aspects of thisdisclosure also provide a semiconductor device, for example comprisingan interposer without through silicon vias. While the foregoing has beendescribed with reference to certain aspects and examples, it will beunderstood by those skilled in the art that various changes may be madeand equivalents may be substituted without departing from the scope ofthe disclosure. In addition, many modifications may be made to adapt aparticular situation or material to the teachings of the disclosurewithout departing from its scope. Therefore, it is intended that thedisclosure not be limited to the particular example(s) disclosed, butthat the disclosure will include all examples falling within the scopeof the appended claims.

What is claimed is:
 1. A method of manufacturing a semiconductorpackage, the method comprising: providing a carrier structurecomprising: a carrier; and a carrier dielectric layer on the carrier;forming an interposer structure on a first side of the carrierstructure, the interposer structure comprising: an interposer dielectriclayer; and an interposer conductive layer; after said forming aninterposer structure, removing the carrier from the carrier structure;and attaching a semiconductor die to the interposer structure.
 2. Themethod of claim 1, wherein: the carrier structure is on a first side ofthe interposer structure; and said attaching a semiconductor die to theinterposer structure comprises, after said removing the carrier from thecarrier structure, attaching the semiconductor die on the first side ofthe interposer structure.
 3. The method of claim 1, wherein after saidattaching a semiconductor die to the interposer structure, the carrierdielectric layer is between the semiconductor die and the interposerstructure.
 4. The method of claim 1, comprising: forming an openingthrough the carrier dielectric layer to expose the interposer conductivelayer; and forming a conductive interconnection structure, a first endof which directly contacts the interposer conductor layer, and a secondend of which comprises a die interconnection pad.
 5. The method of claim1, wherein the carrier comprises a silicon carrier.
 6. The method ofclaim 5, wherein the carrier dielectric layer comprises an inorganicdielectric layer, and the interposer dielectric layer comprises anorganic dielectric layer.
 7. The method of claim 6, wherein theinterposer conductive layer has a finer pitch than a second interposerconductive layer.
 8. The method of claim 1, wherein said removing thecarrier comprises mechanically grinding the carrier.
 9. The method ofclaim 1, wherein the carrier comprises one or more of: glass, ceramic,and/or metal.
 10. A method of manufacturing a semiconductor package, themethod comprising: providing a carrier structure comprising: carrier;and a carrier dielectric layer on the carrier; forming a firstinterposer structure on a first side of the carrier structure, theinterposer structure comprising: a first interposer dielectric layer;and a first interposer conductive layer; after said forming a firstinterposer structure, removing the carrier from the carrier structure;attaching a semiconductor die to the first interposer structure; andforming a second interposer structure on a second side of the carrierstructure opposite the first side of the carrier structure.
 11. Themethod of claim 10, comprising attaching package interconnectionstructures to the second interposer structure.
 12. The method of claim10, wherein the first carrier dielectric layer is between the firstinterposer structure and the second interposer structure.
 13. The methodof claim 10, wherein said forming a first interposer structure isperformed before said attaching a semiconductor die, and said forming asecond interposer structure is performed after said attaching asemiconductor die.
 14. The method of claim 10, wherein the carriercomprises a silicon carrier.
 15. The method of claim 10, wherein thefirst interposer dielectric layer comprises an organic dielectric layer.16. A method of manufacturing a semiconductor package, the methodcomprising: providing a carrier structure comprising: a carrier; and afirst carrier dielectric layer on the carrier; forming a firstinterposer structure on a first side of the carrier structure, theinterposer structure comprising: a first interposer dielectric layer;and a first interposer conductive layer; after said forming a firstinterposer structure, removing the carrier from the carrier structure;and attaching a semiconductor die to the first interposer structure,wherein the first interposer structure is between the semiconductor dieand the first carrier dielectric layer.
 17. The method of claim 16,wherein said removing the carrier is performed after said attaching asemiconductor die.
 18. The method of claim 16, comprising after saidremoving the carrier: forming an aperture through the first carrierdielectric layer; and connecting a conductive interconnection structureto the first interposer conductive layer through the aperture.
 19. Themethod of claim 16, wherein the carrier comprises a silicon carrier. 20.The method of claim 16, wherein the first carrier dielectric layercomprises an inorganic dielectric layer and the first interposerdielectric layer comprises an organic dielectric layer.